公开(公告)号：US09238384B2

公开(公告)日：2016-01-19

申请号：US13752959

申请日：2013-01-29

Applicant: TOPPAN PRINTING CO., LTD.

Inventor： Kazuhiko Shiomitsu ,  Hiroshi Sugimura ,  Toshiaki Kurosu ,  Gaku Suzuki ,  Takao Tomono

IPC: B44C1/20 ,  B44C1/22 ,  A61M37/00 ,  B29C33/42 ,  B81C1/00

CPC classification number: B44C1/227 ,  A61M37/0015 ,  A61M2037/003 ,  A61M2037/0038 ,  A61M2037/0046 ,  A61M2037/0053 ,  B29C33/42 ,  B81B2201/055 ,  B81C1/00111 ,  B81C2201/0198

Abstract: The invention discloses a method of manufacturing a microneedle including the steps of forming an island etching mask having thickness distribution on a substrate, and processing the substrate into a needle by taking advantage of a difference in etching rates between the etching mask and the substrate. The invention enables to readily control a point angle and height of the manufactured needle.