公开(公告)号：US09880522B2

公开(公告)日：2018-01-30

申请号：US14367655

申请日：2012-12-20

Applicant: The Swatch Group Research and Development Ltd

Inventor： Thierry Hessler ,  Nicolas Rebeaud ,  Jean-Luc Helfer ,  David Richard ,  Sebastien Graf

IPC: G04B31/00 ,  G04B31/06 ,  G04B31/02 ,  G04B31/08 ,  B23K26/00 ,  G04B31/004 ,  F16C17/06 ,  F16C17/03 ,  F16C33/10 ,  G04B15/14 ,  G04D3/00

CPC classification number: G04B31/06 ,  B23K26/57 ,  F16C17/03 ,  F16C17/06 ,  F16C33/10 ,  G04B15/14 ,  G04B31/00 ,  G04B31/004 ,  G04B31/02 ,  G04B31/08 ,  G04D3/0069 ,  G04D3/0071

Abstract: A method for manufacturing a component in a substrate including: a) modifying a structure of at least one region of the substrate to make the at least one region more selective; and b) chemically etching the at least one region to selectively manufacture the component.