公开(公告)号：US20200066559A1

公开(公告)日：2020-02-27

申请号：US16669965

申请日：2019-10-31

Applicant: Tokyo Electron Limited

Inventor： Kenichi Shigetomi ,  Takeshi Saikusa ,  Eiichi Sekimoto ,  Takayuki Fukudome ,  Kousuke Yoshihara ,  Suguru Enokida ,  Kazuhiro Takeshita ,  Kazuto Umeki

IPC: H01L21/67 ,  H05B1/02

Abstract: A substrate processing apparatus includes plural heating modules each including a table on which a substrate is placed to be heated, the substrate having plural heated zones. The table has plural heaters each assigned to heat respective ones of the heated zones. Heat generation of the heaters is controlled independently. A control unit controls the heaters such that integrated quantities of heat of the respective heated zones given by the corresponding heaters from first to second time point are substantially identical to each other in each of the heating modules, and are substantially identical to each other among the heating modules. The first time point is set when a temperature transition profile of the substrate is rising toward a process temperature after placing the substrate on the table under a condition where heat generation of the heaters is stable. The second time point is set after the temperature transition profile reaches the process temperature.

公开(公告)号：US11476136B2

公开(公告)日：2022-10-18

申请号：US16669965

申请日：2019-10-31

Applicant: Tokyo Electron Limited

Inventor： Kenichi Shigetomi ,  Takeshi Saikusa ,  Eiichi Sekimoto ,  Takayuki Fukudome ,  Kousuke Yoshihara ,  Suguru Enokida ,  Kazuhiro Takeshita ,  Kazuto Umeki

IPC: H01L21/67 ,  H05B1/02

Abstract: A substrate processing apparatus includes plural heating modules each including a table on which a substrate is placed to be heated, the substrate having plural heated zones. The table has plural heaters each assigned to heat respective ones of the heated zones. Heat generation of the heaters is controlled independently. A control unit controls the heaters such that integrated quantities of heat of the respective heated zones given by the corresponding heaters from first to second time point are substantially identical to each other in each of the heating modules, and are substantially identical to each other among the heating modules. The first time point is set when a temperature transition profile of the substrate is rising toward a process temperature after placing the substrate on the table under a condition where heat generation of the heaters is stable. The second time point is set after the temperature transition profile reaches the process temperature.