公开(公告)号：US10345246B2

公开(公告)日：2019-07-09

申请号：US15611290

申请日：2017-06-01

Applicant: Tokyo Electron Limited

Inventor： Xinkang Tian ,  Ching-Ling Meng ,  Yan Sun

IPC: G01N21/88 ,  G01N21/49 ,  G01N21/95 ,  G01N21/47

Abstract: Provided is a method, system, and apparatus for inspecting a substrate. The method comprises illuminating the substrate with a singular laser beam, the singular laser beam forming an illuminated spot on the substrate and a bright fringe at a surface of the substrate, the bright fringe extending over at least a portion of the illuminated spot, and detecting, by an optical detection system, scattered light from nano-defects present on the substrate within the illuminated spot.