公开(公告)号：US20220355495A1

公开(公告)日：2022-11-10

申请号：US17872150

申请日：2022-07-25

Applicant: X Development LLC

Inventor： Justine Rembisz ,  James Lubin ,  Vincent Nabat ,  Elmar Mair

IPC: B25J19/00 ,  B25J9/16 ,  B25J5/00 ,  G01C21/20 ,  G05D1/02 ,  B60L53/36 ,  B60L58/12

Abstract: A docking station is provided that includes at least one component configured to couple to a robot and an identification surface. The identification surface includes a first curvature that varies at a first substantially constant rate of change along a first dimension the identification includes a second curvature that varies at a second substantially constant rate of change along a second dimension. The second dimension is orthogonal to the first dimension. The identification surface includes a third curvature that varies at a third substantially constant rate of change along a third dimension. The third dimension is orthogonal to the first dimension and the second dimension.

公开(公告)号：US11426885B1

公开(公告)日：2022-08-30

申请号：US16553114

申请日：2019-08-27

Applicant: X Development LLC

Inventor： Justine Rembisz ,  James Lubin ,  Vincent Nabat ,  Elmar Mair

IPC: G01C21/00 ,  B25J19/00 ,  B25J5/00 ,  B25J9/16 ,  B60L58/12 ,  G05D1/02 ,  G01C21/20 ,  B60L53/36

Abstract: A docking station is provided that includes at least one component configured to couple to a robot and an identification surface. The identification surface includes a first curvature that varies at a first substantially constant rate of change along a first dimension the identification includes a second curvature that varies at a second substantially constant rate of change along a second dimension. The second dimension is orthogonal to the first dimension. The identification surface includes a third curvature that varies at a third substantially constant rate of change along a third dimension. The third dimension is orthogonal to the first dimension and the second dimension.

公开(公告)号：US20190382882A1

公开(公告)日：2019-12-19

申请号：US16007582

申请日：2018-06-13

Applicant: X Development LLC

Inventor： Michael Jason Grundmann ,  Sylvia Joan Smullin ,  James Lubin

IPC: C23C14/50 ,  C23C14/34 ,  C23C16/458 ,  C23C14/58 ,  C23C14/02 ,  C23C16/02 ,  C23C16/56 ,  C23C16/52

Abstract: A vacuum deposition system includes a vacuum deposition chamber having multiple regions defined therein; a carousel disposed in the vacuum deposition chamber, the carousel configured to hold multiple substrates, the carousel rotatable around a central spindle; a deposition source positioned to deposit material onto a substrate located in a deposition region of the vacuum deposition chamber; and multiple heating elements disposed in the vacuum deposition chamber in a fixed position relative to the central spindle, each heating element being controllable separately from each other heating element, wherein each heating element is positioned to apply heat to a corresponding region of the vacuum deposition chamber.