摘要:
A purified aqueous solution of hydrogen peroxide is produced by contacting an aqueous solution of hydrogen peroxide containing organic impurities with a hydrophilic porous resin (the product under a tradename "WOFATIT EP63", etc.) having a specific surface area of not less than 800 m.sup.2 /g to remove the organic impurities in the aqueous solution of hydrogen peroxide.
摘要:
A stabilized aqueous solution of hydrogen peroxide comprising at least one metal element selected from the group consisting of tantalum, zirconium, and niobium.The aqueous solution of hydrogen peroxide has excellent storage stability and heat stability.
摘要:
Proposed is an improvement in a method for the preparation of an enriched and purified aqueous hydrogen peroxide solution from a crude aqueous hydrogen peroxide solution comprising the steps of evaporating the crude aqueous hydrogen peroxide solution in an evaporator into vapor with accompanying liquid in the form of a mist, separating the vapor from the mist of liquid in a gas-liquid separator and subjecting the vapor to fractionating distillation in a fractionating distillation column in order to greatly upgrade the product solution relative to the impurity content. The improvement is achieved by subjecting the crude aqueous hydrogen peroxide solution, prior to introduction into the evaporator, to a contacting treatment with a porous synthetic adsorbent resin to remove organic impurities from the crude aqueous hydrogen peroxide solution to such an extent that the crude aqueous hydrogen peroxide solution after the contacting treatment contains organic impurities in an amount not exceeding 50 ppm by weight calculated as organic carbon. Although the mechanism is not well understood, the preliminary removal of organic impurities from the crude aqueous hydrogen peroxide solution has an effect of greatly increasing the efficiency of gas-liquid separation of the vapor accompanied by a mist of liquid in the gas-liquid separator to decrease the amount of contaminant impurities introduced into the distillation column as carried by the mist.
摘要:
The present invention provides a hydrogen peroxide solution for sterilization which has a hydrogen peroxide concentration of 30 to 45% by weight, an Fe concentration of 2 ppb or less and an Al concentration of at least 15 ppb and in which a concentration of a stabilizer comprising orthophosphoric acid is 40 ppm at the most. The above hydrogen peroxide solution for sterilization is used for sterilizing vessels filled with beverages and foods and packaging materials in an aseptic filling equipment. The above hydrogen peroxide solution for sterilization has less evaporation residue, does not clog a narrow piping part such as a spray nozzle and therefore makes it possible to stably operate an aseptic filling equipment. Further, an austenite base stainless material can be used as a material for the transporting facilities and the tanks.
摘要:
The present invention provides a hydrogen peroxide solution for sterilization which has a hydrogen peroxide concentration of 30 to 45% by weight, an Fe concentration of 2 ppb or less and an Al concentration of at least 15 ppb and in which a concentration of a stabilizer comprising orthophosphoric acid is 40 ppm at the most. The above hydrogen peroxide solution for sterilization is used for sterilizing vessels filled with beverages and foods and packaging materials in an aseptic filling equipment. The above hydrogen peroxide solution for sterilization has less evaporation residue, does not clog a narrow piping part such as a spray nozzle and therefore makes it possible to stably operate an aseptic filling equipment. Further, an austenite base stainless material can be used as a material for the transporting facilities and the tanks.
摘要:
A process for producing a purified aqueous hydrogen peroxide solution comprising bringing an aqueous hydrogen peroxide solution containing impurities into contact with an anion exchange resin in the fluoride form is disclosed. According to the process, impurities in the aqueous hydrogen peroxide solution, particularly impurities containing silicon, such as silicates and silicic acid, can efficiently be removed, and a purified aqueous hydrogen peroxide solution having a high purity can be obtained.