RESISTIVE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
    1.
    发明申请
    RESISTIVE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME 有权
    电阻记忆体装置及其制造方法

    公开(公告)号:US20100117041A1

    公开(公告)日:2010-05-13

    申请号:US12344443

    申请日:2008-12-26

    Abstract: A resistive memory device includes a first conductive line on a substrate, a vertical selection diode comprising a nanowire or a nanotube and being arranged over the first conductive line, a resistive element including a resistive layer arranged over the vertical selection diode; and a second conductive line arranged over the resistive element.

    Abstract translation: 电阻式存储器件包括衬底上的第一导电线,包括纳米线或纳米管并且布置在第一导线上的垂直选择二极管,包括布置在垂直选择二极管上的电阻层的电阻元件; 以及布置在所述电阻元件上的第二导线。

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