公开(公告)号：US07519940B2

公开(公告)日：2009-04-14

申请号：US11203329

申请日：2005-08-13

申请人： Hsu-Ting Huang ,  Abdurrahman Sezginer

发明人： Hsu-Ting Huang ,  Abdurrahman Sezginer

IPC分类号： G06P17/50 ,  G01M11/00

CPC分类号： G03F1/36 ,  G03F1/44

摘要： An apparatus and method of compensating for lens imperfections in a projection lithography tool, includes extracting from a diffraction image created by the projection lithography tool a lens transmittance function, and then using the extracted lens transmittance function as a compensator in the lithography projection tool. Another preferred apparatus and method of synthesizing a photomask pattern includes obtaining a phase and an amplitude of a transmittance function of an imaging system; forming a computational model of patterning that includes the transmittance function of the imaging system; and then synthesizing a mask pattern from a given target pattern, by minimizing differences between the target pattern and another pattern that the computational model predicts the synthesized mask pattern will form on a wafer.

摘要翻译： 一种用于补偿投影光刻工具中的透镜缺陷的装置和方法，包括从投影光刻工具产生的衍射图像中提取透镜透射函数，然后使用提取的透镜透射函数作为光刻投影工具中的补偿器。 合成光掩模图案的另一优选装置和方法包括获得成像系统的透射率函数的相位和幅度; 形成包括成像系统的透射功能的图案化计算模型; 然后通过最小化计算模型预测在晶片上形成合成的掩模图案的另一图案之间的差异来合成来自给定目标图案的掩模图案。