Method and system for developing a photo-resist material used as a
recording medium
    111.
    发明授权
    Method and system for developing a photo-resist material used as a recording medium 失效
    用作显影用作记录介质的光致抗蚀材料的方法和系统

    公开(公告)号:US4469424A

    公开(公告)日:1984-09-04

    申请号:US396073

    申请日:1982-07-07

    IPC分类号: G03F7/30 G03D3/06

    CPC分类号: G03F7/3028

    摘要: Disclosed is a method and a system for developing a photo-resist material of an optical recording medium on which digital information is recorded in the form of a series of pits whose position and length represent the digital information. In order to precisely control the size of the pits formed during the developing process, and to reduce the deviation from one recording medium to another, a monitoring beam is applied on the recording medium during the developing process. A diffraction beam of the monitoring energy beam passes through the pits, and is received by a sensor means which monitors the intensity of the diffraction beam and which produces a signal for controlling the supply of developing solution on the recording medium.

    摘要翻译: 公开了一种用于显影光记录介质的光刻胶材料的方法和系统,其上以一系列凹坑的形式记录数字信息,其位置和长度表示数字信息。 为了精确地控制在显影过程中形成的凹坑的尺寸,并且减少从一个记录介质到另一记录介质的偏差,在显影过程中将监控光束施加在记录介质上。 监测能量束的衍射光束通过凹坑,并由传感器装置接收,该传感器装置监测衍射光束的强度并产生用于控制在记录介质上提供显影液的信号。