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11.发明申请Method and apparatus for a reticle with purged pellicle-to-reticle gap 审中-公开具有被清除的防护薄膜到标线间隙的掩模版的方法和装置公开(公告)号：US20050151955A1
公开(公告)日：2005-07-14
申请号：US11034053
申请日：2005-01-13
Applicant: Joseph Laganza , Jorge Ivaldi , Florence Luo
Inventor： Joseph Laganza , Jorge Ivaldi , Florence Luo
CPC classification number: G03F1/64 , G03F7/70933 , G03F7/70983
Abstract: A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
Abstract translation: 一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。 掩模版和防护薄膜之间的框架保持被清除的光学间隙。 框架限定第一和第二相对表面。 第一相对表面限定第一开口，并且被配置为与防护薄膜组合。 第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。 框架的至少一个边缘具有穿过其中的开口。 多孔烧结材料通过框架的边缘填充每个开口。
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12.发明授权公开(公告)号：US06847434B2
公开(公告)日：2005-01-25
申请号：US10314419
申请日：2002-12-09
Applicant: Joseph Laganza , Jorge Ivaldi , Florence Luo
Inventor： Joseph Laganza , Jorge Ivaldi , Florence Luo
CPC classification number: G03F1/64 , G03F7/70933 , G03F7/70983
Abstract: A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.
Abstract translation: 一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清洗的光学间隙的方法和装置。 掩模版和防护薄膜之间的框架保持被清除的光学间隙。 框架限定第一和第二相对表面。 第一相对表面限定第一开口，并且被配置为与防护薄膜组合。 第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。 框架的至少一个边缘具有穿过其中的开口。 多孔烧结材料通过框架的边缘填充每个开口。
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