公开(公告)号：US20100000569A1

公开(公告)日：2010-01-07

申请号：US11600477

申请日：2006-11-16

Applicant: Dale A. Harrison ,  Matthew Weldon

Inventor： Dale A. Harrison ,  Matthew Weldon

IPC: B08B7/00 ,  G01N21/33 ,  G01N21/94

CPC classification number: G01N21/94 ,  G01N21/33 ,  G01N2021/335

Abstract: A technique is provided for monitoring and controlling surface contaminants on optical elements contained within the optical path (or sub-path) of an optical metrology instrument. The technique may be utilized in one embodiment in such a manner as to not require that additional components and/or instrumentation be coupled to, or integrated into, existing metrology equipment. Surface contaminants on optical elements within an optical metrology instrument are monitored so that cleaning procedures can be performed as deemed necessary. The cleaning procedures may include the use of exposing the optical elements to optical radiation. The optical metrology instrument may be an instrument which operates at wavelengths that include vacuum ultra-violet (VUV) wavelengths.

Abstract translation: 提供了一种用于监测和控制包含在光学计量仪器的光路（或子路径）内的光学元件上的表面污染物的技术。 该技术可以在一个实施例中以不要求额外的部件和/或仪器耦合到或集成到现有计量设备中的方式来使用。 监视光学计量仪器内的光学元件上的表面污染物，以便可以根据需要执行清洁程序。 清洁程序可以包括将光学元件暴露于光学辐射的使用。 光学测量仪器可以是在包括真空紫外（VUV）波长的波长下操作的仪器。