Cleaning formulation and method of cleaning surfaces
    11.
    发明申请
    Cleaning formulation and method of cleaning surfaces 审中-公开
    清洁配方和清洁表面的方法

    公开(公告)号:US20030181350A1

    公开(公告)日:2003-09-25

    申请号:US10392794

    申请日:2003-03-20

    Abstract: A cleaning formulation comprising a cleaning agent, a particulate clay material and an aqueous carrier. In a preferred embodiment, the formulation has a pH less than about 1.0 and is characterized by: (i) at least a 90% reduction in viscosity at 25null C. at a shear rate of up to about 0.10 snull1, and (ii) a substantially unchanged viscosity for a period of at least 60 days. The cleaning formulation is thixotropic and has a highly desirable combination of acid stability, temperature stability, electrolyte stability and ultraviolet radiation stability.

    Abstract translation: 一种清洁制剂,其包含清洁剂,颗粒状粘土材料和水性载体。 在优选的实施方案中,制剂具有小于约1.0的pH,并且其特征在于:(i)在高达约0.10s -1的剪切速率下在25℃下至少90%的粘度降低, 和(ii)至少60天的时间内基本上不变的粘度。 清洗配方是触变性的,具有很好的酸稳定性,温度稳定性,电解液稳定性和紫外线辐射稳定性的组合。

    Radiation source module
    12.
    发明申请
    Radiation source module 有权
    辐射源模块

    公开(公告)号:US20030122092A1

    公开(公告)日:2003-07-03

    申请号:US10315198

    申请日:2002-12-10

    CPC classification number: C02F1/325 A61L2/10 C02F2201/3227

    Abstract: There is disclosed an improved radiation source module having a power supply adapted to be at least partially immersed in a fluid being treated. In one embodiment, the power supply is partly immersed in the fluid being treated. In another embodiment, the power supply is fully submersible in the fluid being treated. A fluid treatment system comprising the radiation source module is also described.

    Abstract translation: 公开了一种改进的辐射源模块,其具有适于至少部分地浸没在待处理流体中的电源。 在一个实施例中,电源部分地浸没在被处理的流体中。 在另一个实施例中,电源完全潜入被处理的流体中。 还描述了包括辐射源模块的流体处理系统。

    Fluid treatment system
    13.
    发明授权
    Fluid treatment system 有权
    流体处理系统

    公开(公告)号:US08859989B2

    公开(公告)日:2014-10-14

    申请号:US13920327

    申请日:2013-06-18

    Abstract: A fluid treatment system having an inlet, an outlet, and a fluid treatment zone therebetween. The zone has an array of rows of radiation source assemblies. Each radiation source assembly has a longitudinal axis disposed at an oblique angle with respect to a direction of fluid flow. Each row has a plurality of radiation source assemblies in spaced relation in a direction transverse to the direction of fluid flow, to define a gap through which fluid may flow between an adjacent pair of assemblies. Preferably, all rows in the array are staggered with respect to one another in a direction orthogonal to the direction of fluid flow, such that the gap between an adjacent pair of radiation source assemblies in an upstream row of assemblies is partially or completely obstructed in the direction of fluid flow by a serially disposed radiation source assembly in at least one downstream row.

    Abstract translation: 一种流体处理系统,其间具有入口,出口和流体处理区域。 该区域具有排列的辐射源组件。 每个辐射源组件具有相对于流体流动方向以倾斜角度设置的纵向轴线。 每排具有在横向于流体流动方向的方向上间隔开的多个辐射源组件,以限定一个间隙,流体可以通过该间隙在相邻的一对组件之间流动。 优选地,阵列中的所有行在与流体流动方向正交的方向上彼此交错,使得上游排组件中相邻的一对辐射源组件之间的间隙部分地或完全地被阻挡在 在至少一个下游排中通过串联设置的辐射源组件的流体流动方向。

    On-line device for predicting at least one fluid flow parameter in a process
    14.
    发明申请
    On-line device for predicting at least one fluid flow parameter in a process 失效
    用于在过程中预测至少一个流体流参数的在线设备

    公开(公告)号:US20040093171A1

    公开(公告)日:2004-05-13

    申请号:US10384782

    申请日:2003-03-11

    CPC classification number: C02F1/325 C02F1/008 C02F1/32 C02F2201/326 G01F1/00

    Abstract: There is described an on-line device for predicting at least one fluid flow parameter in a process. In embodiment, the process in question comprises a flow domain having disposed therein a pre-determined portion in which a fluid flows and the device comprises a computer having: (i) a memory for receiving a database, the database comprising relative information in respect of a plurality of nodes or a plurality of particle pathways in the pre-determined portion; (ii) means to receive input data from the process, and (iii) means to calculate the at least one fluid flow parameter from the database and the input data. In another embodiment the process in question comprises a bounded flow domain having disposed therein a pre-determined matrix and the device comprises a computer having: (i) a memory for receiving a database, the database comprising location information for a plurality of nodes or particle pathways in the matrix, (ii) means to receive input data from the process, and (iii) means to calculate the at least one fluid flow parameter from the database and the input data. The device is particularly advantageously employed as a UV dosimeter.

    Abstract translation: 描述了用于在过程中预测至少一个流体流参数的在线装置。 在实施例中,所述方法包括流域,其中设置有流体流过的预定部分,并且该装置包括具有以下的计算机:(i)用于接收数据库的存储器,所述数据库包括关于 预定部分中的多个节点或多个粒子通路; (ii)从过程接收输入数据的装置,以及(iii)从数据库和输入数据计算至少一个流体流量参数的装置。 在另一个实施例中,所述方法包括在其中设置有预定矩阵的有界流域,并且该设备包括具有以下的计算机:(i)用于接收数据库的存储器,所述数据库包括多个节点或粒子的位置信息 矩阵中的路径,(ii)从过程接收输入数据的手段,以及(iii)从数据库和输入数据计算至少一个流体流参数的手段。 该装置特别有利地用作UV剂量计。

    Fluid treatment device
    15.
    发明申请
    Fluid treatment device 有权
    流体处理装置

    公开(公告)号:US20040026337A1

    公开(公告)日:2004-02-12

    申请号:US10374766

    申请日:2003-02-27

    Abstract: A fluid treatment device, preferably for the treatment of water, is described. The device comprises a closed housing having a fluid inlet, a fluid outlet and a fluid treatment zone disposed between the fluid inlet and the fluid outlet. The fluid treatment zone comprises a first irradiation zone and a second irradiation zone. At least one fluid mixing element is interposed between the first irradiation zone and the second irradiation zone.

    Abstract translation: 描述了优选用于处理水的流体处理装置。 该装置包括具有流体入口,流体出口和设置在流体入口和流体出口之间的流体处理区的封闭壳体。 流体处理区包括第一照射区和第二照射区。 在第一照射区域和第二照射区域之间插入至少一个流体混合元件。

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