公开(公告)号：US06847432B2

公开(公告)日：2005-01-25

申请号：US10677235

申请日：2003-10-03

申请人： Yuichi Osakabe ,  Nobuhiro Kodachi

发明人： Yuichi Osakabe ,  Nobuhiro Kodachi

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F9/7088 ,  G03F9/7015

摘要： An alignment system for aligning a reticle having a pattern and an alignment mark with a photosensitive substrate to which the pattern of the reticle is to be transferred, is disclosed. The alignment system includes a movable substrate stage for holding the substrate, and a light-transparent plate having a mark for relative positioning with respect to at least one of the reticle and the substrate stage, wherein positioning of at least one of the reticle and the substrate stage is performed on the basis of the mark provided on the light-transparent plate.

摘要翻译： 公开了一种用于将具有图案和对准标记的掩模版与用于传送掩模版图形的感光基板对准的对准系统。 对准系统包括用于保持衬底的可移动衬底台和具有相对于掩模版和衬底台中的至少一个相对定位的标记的光透明板，其中定位至少一个掩模版和 基于设置在透光板上的标记进行基板台。