公开(公告)号：US10410841B2

公开(公告)日：2019-09-10

申请号：US15989019

申请日：2018-05-24

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.

公开(公告)号：US20190122861A1

公开(公告)日：2019-04-25

申请号：US16226536

申请日：2018-12-19

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.