公开(公告)号：US20220157562A1

公开(公告)日：2022-05-19

申请号：US17590681

申请日：2022-02-01

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

Abstract: A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages. The first plurality of gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the second plurality of gas injection passages are angularly spaced apart arcuate channels at a different second radial distance from the center of the hub

公开(公告)号：US11139150B2

公开(公告)日：2021-10-05

申请号：US16555509

申请日：2019-08-29

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455 ,  H05H1/34

Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.

公开(公告)号：US10861681B2

公开(公告)日：2020-12-08

申请号：US15961482

申请日：2018-04-24

Applicant: Applied Materials, Inc.

Inventor： James L'Heureux ,  Ryan T. Downey ,  David Muquing Hou ,  Yan Rozenzon

IPC: H01J37/32 ,  B01D53/32 ,  H01L21/67

Abstract: Embodiments disclosed herein include an abatement system for abating compounds produced in semiconductor processes. The abatement system includes an exhaust cooling apparatus located downstream of a plasma source. The exhaust cooling apparatus includes a plate and a cooling plate disposed downstream of the plate. During operation, materials collected on the plate react with cleaning radicals to form a gas. The temperature of the plate is higher than the temperature of the cooling plate in order to improve the reaction rate of the reaction of the cleaning radicals and the materials on the plate.

公开(公告)号：US20150371826A1

公开(公告)日：2015-12-24

申请号：US14762224

申请日：2014-02-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32

CPC classification number: H01J37/3244 ,  C23C16/45561 ,  C23C16/45578 ,  C23C16/4558 ,  H01J37/32082

Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.

Abstract translation: 等离子体反应器的环形盖板具有上层和下层的气体分配通道，该气体分配通道沿着从气体供应管线到天花板气体喷嘴的相应气体分配通道的等长路径分配气体。

公开(公告)号：US10163606B2

公开(公告)日：2018-12-25

申请号：US14762224

申请日：2014-02-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.

公开(公告)号：US20150371831A1

公开(公告)日：2015-12-24

申请号：US14762219

申请日：2014-02-03

Applicant: APPLIED MATERIALS, INC.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32

CPC classification number: H01J37/32449 ,  C23C16/45561 ,  C23C16/45563 ,  C23C16/45578 ,  H01J37/3244

Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.

Abstract translation: 气体注入系统包括（a）侧气室，（b）多个与所述侧气室连通的N个气体入口，（c）从所述气室径向向内延伸的多个侧气体出口，（d）N路 具有分别与所述N个气体入口相连的N个输出的气体流量比控制器，以及（e）具有M个输出的M路气体流量比控制器，耦合到所述可调气体喷嘴的所述M个输出中的相应的M个输出端和所述N个气体入口 - 天然气流量比控制器。

公开(公告)号：US11728141B2

公开(公告)日：2023-08-15

申请号：US17590681

申请日：2022-02-01

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

CPC classification number: H01J37/3244 ,  C23C16/4558 ,  C23C16/45561 ,  C23C16/45578 ,  H01J37/32082

Abstract: A gas distribution hub for a plasma chamber. The hub has a nozzle including a plurality of inner gas injection passage and a plurality of outer gas injection passages. The first plurality of gas injection passages are angularly spaced-apart arcuate channels at a first radial distance from a center of the hub, and the second plurality of gas injection passages are angularly spaced apart arcuate channels at a different second radial distance from the center of the hub.

公开(公告)号：US11244811B2

公开(公告)日：2022-02-08

申请号：US16226536

申请日：2018-12-19

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.

公开(公告)号：US10410841B2

公开(公告)日：2019-09-10

申请号：US15989019

申请日：2018-05-24

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

Abstract: A gas injection system includes (a) a side gas plenum, (b) a plurality of N gas inlets coupled to said side gas plenum, (c) plural side gas outlets extending radially inwardly from said plenum, (d) an N-way gas flow ratio controller having N outputs coupled to said N gas inlets respectively, and (e) an M-way gas flow ratio controller having M outputs, respective ones of said M outputs coupled to said tunable gas nozzle and a gas input of said N-way gas flow ratio controller.

公开(公告)号：US20190122861A1

公开(公告)日：2019-04-25

申请号：US16226536

申请日：2018-12-19

Applicant: Applied Materials, Inc.

Inventor： Yan Rozenzon ,  Kyle Tantiwong ,  Imad Yousif ,  Vladimir Knyazik ,  Bojenna Keating ,  Samer Banna

IPC: H01J37/32 ,  C23C16/455

Abstract: An annular lid plate of a plasma reactor has upper and lower layers of gas distribution channels distributing gas along equal length paths from gas supply lines to respective gas distribution passages of a ceiling gas nozzle.