公开(公告)号：US20240098871A1

公开(公告)日：2024-03-21

申请号：US17949862

申请日：2022-09-21

Applicant: Applied Materials, Inc.

Inventor： Wai-Ming Tam ,  Klaus Becker ,  William Herron Park, JR. ,  Frank Sinclair

IPC: H05H7/22 ,  H05H7/02

CPC classification number: H05H7/22 ,  H05H7/02 ,  H05H2007/025 ,  H05H2007/222

Abstract: An apparatus may include a drift tube assembly having a plurality of drift tubes to conduct an ion beam along a beam propagation direction. The plurality of drift tubes may define a multi-gap configuration corresponding to a plurality of acceleration gaps, wherein at least one powered drift tube of the drift tube assembly is coupled to receive an RF voltage signal. The apparatus may also include a DC electrode assembly that includes a conductor line, arranged within a resonator coil that is coupled to receive a DC voltage signal into the at least one powered drift tube. The DC electrode assembly may also include a DC electrode arrangement, connected to the conductor line and disposed within the at least one powered drift tube.

公开(公告)号：US11542594B2

公开(公告)日：2023-01-03

申请号：US17235351

申请日：2021-04-20

Applicant: APPLIED Materials, Inc.

Inventor： Graham Wright ,  Klaus Becker

IPC: C23C14/34 ,  H01J37/34

Abstract: An advanced sputter target is disclosed. The advanced sputter target comprises two components, a porous carrier, and a metal material disposed within that porous carrier. The porous carrier is designed to be a high porosity, open cell structure such that molten material may flow through the carrier. The porous carrier also provides structural support for the metal material. The cell sizes of the porous carrier are dimensioned such that the capillary action and surface tension prohibits the metal material from spilling, dripping, or otherwise exiting the porous carrier. In some embodiments, the porous carrier is an open cell foam, a weave of strands or stacked meshes.

公开(公告)号：US11008649B2

公开(公告)日：2021-05-18

申请号：US16191526

申请日：2018-11-15

Applicant: APPLIED Materials, Inc.

Inventor： Graham Wright ,  Klaus Becker

IPC: H01J37/34 ,  C23C14/34

Abstract: An advanced sputter target is disclosed. The advanced sputter target comprises two components, a porous carrier, and a metal material disposed within that porous carrier. The porous carrier is designed to be a high porosity, open cell structure such that molten material may flow through the carrier. The porous carrier also provides structural support for the metal material. The cell sizes of the porous carrier are dimensioned such that the capillary action and surface tension prohibits the metal material from spilling, dripping, or otherwise exiting the porous carrier. In some embodiments, the porous carrier is an open cell foam, a weave of strands or stacked meshes.