公开(公告)号：US11139196B2

公开(公告)日：2021-10-05

申请号：US16650939

申请日：2018-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes Roset ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Mark Constant Johannes Baggen ,  Gijs Kramer ,  Roger Anton Marie Timmermans ,  Frank Pieter Albert Van Den Berkmortel

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.