公开(公告)号：US12249535B2

公开(公告)日：2025-03-11

申请号：US18354227

申请日：2023-07-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes Roset ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Mark Constant Johannes Baggen ,  Gijs Kramer ,  Roger Anton Marie Timmermans ,  Frank Pieter Albert Van Den Berkmortel

IPC: H01L21/687 ,  G03F7/00

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US11139196B2

公开(公告)日：2021-10-05

申请号：US16650939

申请日：2018-09-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes Roset ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Mark Constant Johannes Baggen ,  Gijs Kramer ,  Roger Anton Marie Timmermans ,  Frank Pieter Albert Van Den Berkmortel

IPC: G03F7/20 ,  H01L21/687

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.

公开(公告)号：US20150034788A1

公开(公告)日：2015-02-05

申请号：US14382228

申请日：2013-01-30

Applicant: ASML Netherlands B.V.

Inventor： Arno Jan Bleeker ,  Thomas Josephus Maria Castenmill ,  Pieter Willem Herman De Jager ,  Heine Melle Mulder ,  Koen Jacobus Johannes Maria Zaal ,  Theodorus Petrus Maria Cadee ,  Danny Maria Hubertus Philips ,  Ruud Antonius Catharina Maria Beere ,  Roger Anton Marie Timmermans

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/20 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70366 ,  G03F7/70383 ,  G03F7/70391 ,  G03F7/704 ,  G03F7/70425 ,  G03F7/70475

Abstract: A projection system, configured to project a radiation beam onto a target, includes a rotatable frame (8) configured to rotate about an axis defining a tangential direction and a radial direction, wherein the rotatable frame holds a lens configured to focus the radiation beam in only the tangential or radial direction; and a stationary part comprising a substantially stationary lens configured to focus the radiation beam in only the other of the tangential or radial direction. Provisions are made to prevent moments to be exerted on the lens held by the rotatable frame.

Abstract translation: 配置成将辐射束投影到目标上的投影系统包括可旋转的框架（8），其被配置为围绕限定切线方向和径向方向的轴线旋转，其中可旋转框架保持配置成将辐射束聚焦在 只有切向或径向; 以及固定部分，其包括基本上固定的透镜，其被配置为仅将所述辐射束聚焦在所述切向或径向方向中的另一个中。 作出规定以防止在由可旋转框架保持的镜片上施加力矩。

公开(公告)号：US11749556B2

公开(公告)日：2023-09-05

申请号：US17481978

申请日：2021-09-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes Roset ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Simon Karel Ravensbergen ,  Mark Constant Johannes Baggen ,  Gijs Kramer ,  Roger Anton Marie Timmermans ,  Frank Pieter Albert Van Den Berkmortel

IPC: H01L21/687 ,  G03F7/20 ,  G03F7/00

CPC classification number: H01L21/6875 ,  G03F7/707 ,  G03F7/70341

Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder having a main body having a main body surface, a plurality of main burls projecting from the main body surface, wherein each main burl has a distal end surface configured to support the substrate, a first seal member projecting from the main body surface and having an upper surface, the first seal member surrounding the plurality of main burls and configured to restrict the passage of liquid between the substrate and the main body surface radially inward past the first seal member, and a plurality of minor burls projecting from the upper surface of the first seal member, wherein each minor burl has a distal end surface configured to support the substrate.