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公开(公告)号：US11183360B2
公开(公告)日：2021-11-23
申请号：US16650815
申请日：2018-09-25
Applicant: ASML Netherlands B.V.
Inventor： Jian Zhang , Zhiwen Kang , Yixiang Wang
IPC: H01J37/22 , H01J37/244
Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.
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