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公开(公告)号：US11808930B2
公开(公告)日：2023-11-07
申请号：US16650862
申请日：2018-09-25
发明人： Jian Zhang , Zhiwen Kang , Yixiang Wang
CPC分类号： G02B21/02 , G02B9/00 , G02B13/18 , G09B9/10 , H01J37/226 , H01J37/28 , G01N23/2251 , H01J2237/26 , H01J2237/2802
摘要： An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.
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公开(公告)号：US11682538B2
公开(公告)日：2023-06-20
申请号：US17533078
申请日：2021-11-22
发明人： Jian Zhang , Zhiwen Kang , Yixiang Wang
IPC分类号： H01J37/22 , H01J37/244
CPC分类号： H01J37/226 , H01J37/244 , H01J2237/20292
摘要： An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.
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3.发明授权公开(公告)号：US11728131B2
公开(公告)日：2023-08-15
申请号：US17553357
申请日：2021-12-16
发明人： Ning Ye , Jun Jiang , Jian Zhang , Yixiang Wang
IPC分类号： H01J37/28 , H01J37/244 , H01J37/26
CPC分类号： H01J37/28 , H01J37/244 , H01J37/265 , H01J2237/0047 , H01J2237/2817
摘要： Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.
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公开(公告)号：US11521826B2
公开(公告)日：2022-12-06
申请号：US16650840
申请日：2018-09-21
发明人： Jian Zhang , Zhiwen Kang , Yixiang Wang
摘要： An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection grating pattern, and a projection optical unit for projecting the projection grating pattern to a sample; and a detection unit including a first detection grating mask including a first detection grating pattern, a second detection grating mask including a second detection grating pattern, and a detection optical system for forming a first grating image from the projection grating pattern onto the first detection grating mask and forming a second grating image from the projection grating pattern onto the second detection grating masks. The first and second detection grating patterns at least partially overlap the first and second grating images, respectively.
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公开(公告)号：US11482399B2
公开(公告)日：2022-10-25
申请号：US16652352
申请日：2018-09-25
发明人： Jian Zhang , Qing Jiu Chen , Yixiang Wang
IPC分类号： H01J37/22 , G01N21/95 , G01N21/956 , G02B27/09
摘要： A system and method for advanced charge control of a light beam is provided. The system comprising a laser source comprising a laser diode for emitting a beam and a beam homogenizer to homogenize the emitted beam. The system and methods further comprise a beam shaper configured to shape the emitted beam using an anamorphic prism group and a driver configured to direct the shaped beam to a specified position on a wafer, wherein the laser source, the beam shaper, and the driver are coaxially aligned.
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6.发明授权公开(公告)号：US12125669B2
公开(公告)日：2024-10-22
申请号：US18362757
申请日：2023-07-31
发明人： Ning Ye , Jun Jiang , Jian Zhang , Yixiang Wang
IPC分类号： H01J37/28 , H01J37/244 , H01J37/26
CPC分类号： H01J37/28 , H01J37/244 , H01J37/265 , H01J2237/0047 , H01J2237/2817
摘要： Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.
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公开(公告)号：US12105036B2
公开(公告)日：2024-10-01
申请号：US17276124
申请日：2019-08-26
发明人： Jian Zhang , Ning Ye , DanJing Huang , Bin-Da Chan
IPC分类号： G01N23/2251 , G01J1/42 , G06T7/00
CPC分类号： G01N23/2251 , G01J1/4257 , G06T7/001 , G01N2223/07 , G01N2223/418 , G01N2223/507 , G01N2223/6116 , G06T2207/10016 , G06T2207/10144 , G06T2207/30108
摘要： A system and a method for monitoring a beam in an inspection system are provided. The system includes an image sensor configured to collect a sequence of images of a beam spot of a beam formed on a surface, each image of the sequence of images having been collected at a different exposure time of the image sensor, and a controller configured to combine the sequence of images to obtain a beam profile of the beam.
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公开(公告)号：US11183360B2
公开(公告)日：2021-11-23
申请号：US16650815
申请日：2018-09-25
发明人： Jian Zhang , Zhiwen Kang , Yixiang Wang
IPC分类号： H01J37/22 , H01J37/244
摘要： An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.
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公开(公告)号：US12072181B2
公开(公告)日：2024-08-27
申请号：US17487896
申请日：2021-09-28
发明人： Yan Wang , Jian Zhang , Zhiwen Kang , Yixiang Wang
CPC分类号： G01B15/08 , H01J37/20 , H01J37/21 , H01J37/222 , H01J37/28 , H01J2237/20235 , H01J2237/2814
摘要： An inspection apparatus for adjusting a working height for a substrate for multiple target heights is disclosed. The inspection apparatus includes a radiation source configured to provide a radiation beam and a beam splitter configured to split the radiation beam into multiple beamlets that each reflect off a substrate. Each beamlet contains light of multiple wavelengths. The inspection apparatus includes multiple light reflecting components, wherein each light reflecting component is associated with one of the beamlets reflecting off the substrate and is configured to support a different target height for the substrate by detecting a height or a levelness of the substrate based on the beamlet reflecting off the substrate.
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