公开(公告)号：US10725381B2

公开(公告)日：2020-07-28

申请号：US16117589

申请日：2018-08-30

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen Van Der Post ,  Stefan Michael Bruno Bäumer ,  Peter Danny Van Voorst ,  Teunis Willem Tukker ,  Ferry Zijp ,  Han-Kwang Nienhuys ,  Jacobus Maria Antonius Van Den Eerenbeemd

IPC: G21K1/00 ,  G03F7/20 ,  G21K7/00 ,  G21K1/06 ,  G02B17/04 ,  G01N21/47 ,  G01N21/95

Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.

公开(公告)号：US10451559B2

公开(公告)日：2019-10-22

申请号：US16102178

申请日：2018-08-13

Applicant: ASML Netherlands B.V.

Inventor： Peter Danny Van Voorst ,  Nan Lin ,  Sander Bas Roobol ,  Simon Gijsbert Josephus Mathijssen ,  Sietse Thijmen Van Der Post

IPC: G01N21/88 ,  G03F7/20 ,  G01N21/95 ,  H05G2/00 ,  G01N21/956

Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.