公开(公告)号：US11327412B2

公开(公告)日：2022-05-10

申请号：US16061947

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Ronald Franciscus Herman Hugers ,  Martinus Cornelis Reijnen ,  Paulus Antonius Andreas Teunissen

IPC: G03F9/00 ,  G01B11/25 ,  G01N21/95 ,  H01L21/66

Abstract: A topography measurement system includes a radiation source; a first grating; imaging optics; a movement mechanism; detection optics; a second grating; and a detector. The radiation source is configured to generate a radiation beam and includes a light emitting diode to produce to the radiation. The first grating is configured to pattern the radiation beam. The imaging optics is configured to form a first image of the first grating at a target location on a substrate. The movement mechanism is operable to move the substrate relative to the image of the first grating such that the target location moves relative to the substrate. The detection optics is configured to receive radiation from the target location of the substrate and form an image of the first image at the second grating. The detector is configured to receive radiation transmitted through the second grating and produce an output signal.