公开(公告)号：US09488465B2

公开(公告)日：2016-11-08

申请号：US13679898

申请日：2012-11-16

Applicant: ASML Netherlands B.V.

Inventor： Laurent Khuat Duy ,  Martinus Cornelis Reijnen ,  Lukasz Jerzy Macht ,  Erik Johan Koop

IPC: G01B11/00 ,  G03B27/34 ,  G01B11/06 ,  G03F9/00

CPC classification number: G01B11/00 ,  G01B11/0608 ,  G03B27/34 ,  G03F9/7034

Abstract: The invention provides a level sensor configured to determine a height level of a surface of a substrate, comprising a detection unit arranged to receive a measurement beam after reflection on the substrate, wherein the detection unit comprises an array of detection elements, wherein each detection element is arranged to receive a part of the measurement beam reflected on a measurement subarea of the measurement area, and is configured to provide a measurement signal based on the part of the measurement beam received by the respective detection element, and wherein the processing unit is configured to calculate, in dependence of a selected resolution at the measurement subarea, a height level of the measurement subarea, or to calculate a height level of a combination of multiple measurement subareas.

Abstract translation: 本发明提供了一种水平传感器，其被配置为确定衬底的表面的高度水平，包括检测单元，其布置成在衬底上反射之后接收测量光束，其中检测单元包括检测元件阵列，其中每个检测元件 被配置为接收在测量区域的测量子区域上反射的测量光束的一部分，并且被配置为基于由各个检测元件接收的测量光束的一部分来提供测量信号，并且其中，配置处理单元 根据测量子区域中的选定分辨率计算测量子区域的高度水平，或计算多个测量子区域的组合的高度水平。

公开(公告)号：US11327412B2

公开(公告)日：2022-05-10

申请号：US16061947

申请日：2016-11-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Ronald Franciscus Herman Hugers ,  Martinus Cornelis Reijnen ,  Paulus Antonius Andreas Teunissen

IPC: G03F9/00 ,  G01B11/25 ,  G01N21/95 ,  H01L21/66

Abstract: A topography measurement system includes a radiation source; a first grating; imaging optics; a movement mechanism; detection optics; a second grating; and a detector. The radiation source is configured to generate a radiation beam and includes a light emitting diode to produce to the radiation. The first grating is configured to pattern the radiation beam. The imaging optics is configured to form a first image of the first grating at a target location on a substrate. The movement mechanism is operable to move the substrate relative to the image of the first grating such that the target location moves relative to the substrate. The detection optics is configured to receive radiation from the target location of the substrate and form an image of the first image at the second grating. The detector is configured to receive radiation transmitted through the second grating and produce an output signal.

公开(公告)号：US10429748B2

公开(公告)日：2019-10-01

申请号：US15576444

申请日：2016-06-06

Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

Inventor： Joseph Harry Lyons ,  Martinus Cornelis Reijnen ,  Erik Johan Arlemark ,  Nicolae Marian Ungureanu ,  James Hamilton Walsh

IPC: G03F7/20 ,  G01B13/12 ,  G03F9/00

Abstract: An apparatus, such as a lithographic apparatus, has a metrology frame that has a reference frame mounted thereon that includes a reference surface. A gas gauge is movable relative to the reference frame, metrology frame, and a measured surface. A reference nozzle in the gas gauge provides gas to the reference surface and a measurement nozzle provides gas to the measured surface. A microelectromechanical (MEM) sensor may be used with the gas gauge to sense a difference in backpressure from each of the reference nozzle and the measurement nozzle. Optionally, multiple gas gauges are positioned in an array, which may extend in a direction that is substantially parallel to a plane of the measured surface. The gauges may be fluidly connected to a reference nozzle of the gas gauge. A channel may distribute gas across the array.