公开(公告)号：US20130176547A1

公开(公告)日：2013-07-11

申请号：US13786400

申请日：2013-03-05

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Wilhelmus Petrus DE BOEIJ ,  Hendrikus Robertus Marie VAN GREEVENBROEK ,  Michel Fransois Hubert KLAASSEN ,  Martijn Gerard Dominique WEHRENS ,  Haico Victor KOK ,  Wilhelmus Jacobus Maria Rooijakkers ,  Tammo UITTERDIJK

IPC: G03F7/20

CPC classification number: G03F7/70133 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

Abstract: A lithographic apparatus includes an illumination system, a support, a patterning device, a substrate table, a projection system, and a detector. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable and a polarization analyzer, such as a linear polarizer. The polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.

Abstract translation: 光刻设备包括照明系统，支撑件，图案形成装置，衬底台，投影系统和检测器。 该装置还包括可调节的诸如四分之一波片的偏振改变元件和诸如线性偏振器的偏振分析器。 偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。 通过对偏振变化元件的不同旋转取向进行强度测量，可以获得关于图案形成装置的电平处的辐射的偏振状态的信息。 由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。