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公开(公告)号：US20230408927A1
公开(公告)日：2023-12-21
申请号：US18250542
申请日：2021-11-16
Applicant: The University of Hong Kong
Inventor： Wendi LI , Zhuofei GAN , Siyi MIN
IPC: G03F7/00
CPC classification number: G03F7/70408 , G03F7/70133
Abstract: Provided is a method of laser interference lithography, including: performing an interference exposure on a wafer coated with a photoresist; and performing a patterned flood exposure on the interference-exposed wafer, wherein the performing the flood exposure includes: determining a first light field distribution in the interference-exposed wafer; determining a light field distribution of the floodlight source as a second light field distribution based on the first light field distribution, an expected pattern distribution, and parameters of the floodlight source used for the flood exposure; and patterning the light field distribution of the floodlight source based on the second light field distribution, and controlling the floodlight source having the patterned light field distribution to perform the flood exposure on the interference-exposed wafer, so as to form the expected pattern distribution in the flood-exposed wafer.
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公开(公告)号：US20230221571A1
公开(公告)日：2023-07-13
申请号：US18095175
申请日：2023-01-10
Applicant: Carl Zeiss SMT GmbH
Inventor： Ulrich Matejka , Sascha Perlitz , Johannes Ruoff
CPC classification number: G02B27/142 , G03F7/70133
Abstract: The invention relates to an optical system and, in particular for characterizing a microlithography mask, comprising a light source for generating light of a wavelength of less than 30 nm, an illumination beam path leading from the light source to an object plane, an imaging beam path leading from the object plane to an image plane and a beam splitter, via which both the illumination beam path and the imaging beam path run.
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公开(公告)号：US20190146353A1
公开(公告)日：2019-05-16
申请号：US16248413
申请日：2019-01-15
Applicant: Carl Zeiss SMT GmbH
Inventor： Alexander Winkler , Daniel Lenz
IPC: G03F7/20
CPC classification number: G03F7/70116 , G02B26/0833 , G03F7/70133 , G03F7/702 , G03F7/70516
Abstract: A method for setting an illumination setting for illuminating an object field of a projection exposure apparatus includes taking into account the sensitivity of a performance variable for changes in the intensity of the illumination radiation in the illumination pupil.
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公开(公告)号：US10073345B2
公开(公告)日：2018-09-11
申请号：US15269160
申请日：2016-09-19
Applicant: NIKON CORPORATION
Inventor： Yuichi Shibazaki
CPC classification number: G03F7/20 , G01B11/27 , G03F7/70133 , G03F7/70358 , G03F7/70483 , G03F7/70516 , G03F7/70725 , G03F7/70775 , G03F9/70 , H01L21/681 , Y10T29/49002
Abstract: A position of a substrate-holding movable body is controlled based on positional information measured with a measurement system, and correction information of the positional information of the movable body also is measured with the measurement system. The correction information is measured within a first area in which position measurement of the movable body can be performed with each of a second number of heads provided on the movable body, the first area being of a predetermined area, in the predetermined area the movable body being moved in an exposure operation of the substrate, and the second number of heads being larger in number than a first number of heads used in position control of the movable body.
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公开(公告)号：US09971246B2
公开(公告)日：2018-05-15
申请号：US15269030
申请日：2016-09-19
Applicant: NIKON CORPORATION
Inventor： Yuichi Shibazaki
CPC classification number: G03F7/20 , G01B11/27 , G03F7/70133 , G03F7/70358 , G03F7/70483 , G03F7/70516 , G03F7/70725 , G03F7/70775 , G03F9/70 , H01L21/681 , Y10T29/49002
Abstract: Within area where of four heads installed on a wafer stage, heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the wafer stage is driven based on positional information which is obtained using the first head group, as well as obtain the displacement (displacement of position, rotation, and scaling) between the first and second reference coordinate systems corresponding to the first and second head groups using the positional information obtained using the first and second head groups. By using the results and correcting measurement results obtained using the second head group, the displacement between the first and second reference coordinate systems is calibrated, which allows the measurement errors that come with the displacement between areas on scale plates where each of the four heads face.
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Patent Agency Ranking
6.发明申请公开(公告)号：US20180024439A1
公开(公告)日：2018-01-25
申请号：US15627816
申请日：2017-06-20
Applicant: Carl Zeiss SMT GmbH
Inventor： Oliver Natt , Frank Schlesener
IPC: G03F7/20
CPC classification number: G03F7/70133 , G03F7/70091 , G03F7/70125 , G03F7/70141 , G03F7/70191
Abstract: A method of operating an illumination system of a microlithographic projection exposure apparatus is provided. A set of illumination parameters that describe properties of a light bundle which converges at a point on a mask to be illuminated by the illumination system is first determined. Optical elements whose optical effect on the illumination parameters can be modified as a function of control commands are furthermore determined, as well as sensitivities with which the illumination parameters react to an adjustment of the optical elements, induced by the control commands. The control commands are then determined while taking the previously determined sensitivities into account, such that deviations of the illumination parameters from predetermined target illumination parameters satisfy a predetermined minimisation criterion. These control commands are applied to the optical elements, before the mask is illuminated.
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公开(公告)号：US09645500B2
公开(公告)日：2017-05-09
申请号：US14910995
申请日：2014-07-24
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70133 , G02B27/44 , G02B27/50 , G03F7/70041 , H01S3/005 , H01S3/1307 , H01S3/2391 , H05G2/006 , H05G2/008
Abstract: A radiation source includes a nozzle configured to direct a stream of fuel droplets along a droplet path towards a plasma formation location, and is configured to receive a gaussian radiation beam having gaussian intensity distribution, having a predetermined wavelength and propagating along a predetermined trajectory, and further configured to focus the radiation beam on a fuel droplet at the plasma formation location. The radiation source includes a phase plate structure including one or more phase plates. The phase plate structure has a first zone and a second zone. The zones are arranged such that radiation having the predetermined wavelength passing through the first zone and radiation having the predetermined wavelength passing through the second zone propagate along respective optical paths having different optical path lengths. A difference between the optical path lengths is an odd number of times half the predetermined wavelength.
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8.发明授权公开(公告)号：US09632423B2
公开(公告)日：2017-04-25
申请号：US14740071
申请日：2015-06-15
Applicant: CANON KABUSHIKI KAISHA
Inventor： Yoshikuni Yoneyama , Kentaro Hiruma , Noboru Osaka
CPC classification number: G03F7/70141 , G02B19/0028 , G02B19/0047 , G03F7/7005 , G03F7/70091 , G03F7/70133
Abstract: An illumination device includes a plurality of light source units, each including a light source, a mirror that reflects light from the light source, and one or more light blocking members that block the light that is reflected by the mirror and travels toward the illumination surface; and an illumination optical system that forms a light intensity distribution of superposed light, in which the light from each of the light source units is superposed, in a pupil plane and illuminates the illumination surface with the superposed light. In the light intensity distribution in the pupil plane of the illumination optical system, positions of shadows of all of the light blocking members included in one of the light source units are separated from positions of shadows of all of the light blocking members included in at least one of the remaining light source units.
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公开(公告)号：US20170003601A1
公开(公告)日：2017-01-05
申请号：US15269030
申请日：2016-09-19
Applicant: NIKON CORPORATION
Inventor： Yuichi SHIBAZAKI
IPC: G03F7/20
CPC classification number: G03F7/20 , G01B11/27 , G03F7/70133 , G03F7/70358 , G03F7/70483 , G03F7/70516 , G03F7/70725 , G03F7/70775 , G03F9/70 , H01L21/681 , Y10T29/49002
Abstract: Within area where of four heads installed on a wafer stage, heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the wafer stage is driven based on positional information which is obtained using the first head group, as well as obtain the displacement (displacement of position, rotation, and scaling) between the first and second reference coordinate systems corresponding to the first and second head groups using the positional information obtained using the first and second head groups. By using the results and correcting measurement results obtained using the second head group, the displacement between the first and second reference coordinate systems is calibrated, which allows the measurement errors that come with the displacement between areas on scale plates where each of the four heads face.
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10.发明授权公开(公告)号：US09341957B2
公开(公告)日：2016-05-17
申请号：US14948589
申请日：2015-11-23
Applicant: Carl Zeiss SMT GmbH
Inventor： Oliver Natt , Frank Schlesener
IPC: G03F7/20
CPC classification number: G03F7/70133 , G03F7/70091 , G03F7/70125 , G03F7/70141 , G03F7/70191
Abstract: A method of operating an illumination system of a microlithographic projection exposure apparatus is provided. A set of illumination parameters that describe properties of a light bundle which converges at a point on a mask to be illuminated by the illumination system is first determined. Optical elements whose optical effect on the illumination parameters can be modified as a function of control commands are furthermore determined, as well as sensitivities with which the illumination parameters react to an adjustment of the optical elements, induced by the control commands. The control commands are then determined while taking the previously determined sensitivities into account, such that deviations of the illumination parameters from predetermined target illumination parameters satisfy a predetermined minimization criterion. These control commands are applied to the optical elements, before the mask is illuminated.
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