公开(公告)号：US20200251360A1

公开(公告)日：2020-08-06

申请号：US16264034

申请日：2019-01-31

Applicant: Applied Materials, Inc.

Inventor： Tianqing Liao ,  Sima Didari ,  Harikrishnan Rajagopal

IPC: H01L21/67 ,  G05B23/02 ,  H01J37/317

Abstract: Methods, systems, and non-transitory computer readable medium are provided for correcting component failures in ion implant semiconductor manufacturing tool. A method includes receiving, from sensors associated with an ion implant tool, current sensor data corresponding to features; performing feature analysis to generate additional features for the current sensor data; providing the additional features as input to a trained machine learning model; obtaining one or more outputs from the trained machine learning model, where the one or more outputs are indicative of a level of confidence of a predicted window; predicting, based on the level of confidence of the predicted window, whether one or more components of the ion implant tool are within a pre-failure window; and responsive to predicting that the one or more components are within the pre-failure window, performing a corrective action associated with the ion implant tool.