公开(公告)号：US10364180B2

公开(公告)日：2019-07-30

申请号：US15539472

申请日：2016-01-06

Applicant: CORNING INCORPORATED

Inventor： Baifeng Chen ,  Haixing Chen ,  Ling Chen ,  Haofei Gong ,  Jun Hou

IPC: C03C15/00

Abstract: An apparatus for producing anti-glare surfaces includes an etching cream dipping tank and a sub-tank arranged to receive a slurry of etching cream. A pumping unit is fluidly coupled to the etching cream dipping tank and the sub-tank such that the pumping unit is operable to selectively self-circulate the slurry of etching cream in the sub-tank to improve homogeneity of the etching cream and transfer a volume of the homogenized etching cream from the sub-tank to the etching cream dipping tank.