公开(公告)号：US20170369362A1

公开(公告)日：2017-12-28

申请号：US15539472

申请日：2016-01-06

申请人： CORNING INCORPORATED

发明人： Baifeng Chen ,  Haixing Chen ,  Ling Chen ,  Haofei Gong ,  Jun Hou

IPC分类号： C03C15/00

CPC分类号： C03C15/00

摘要： An apparatus for producing anti-glare surfaces includes an etching cream dipping tank and a sub-tank arranged to receive a slurry of etching cream. A pumping unit is fluidly coupled to the etching cream dipping tank and the sub-tank such that the pumping unit is operable to selectively self-circulate the slurry of etching cream in the sub-tank to improve homogeneity of the etching cream and transfer a volume of the homogenized etching cream from the sub-tank to the etching cream dipping tank.

公开(公告)号：US20170285227A1

公开(公告)日：2017-10-05

申请号：US15508307

申请日：2015-09-04

申请人： CORNING INCORPORATED

发明人： Haixing Chen ,  Ling Chen ,  Haofei Gong ,  Liping Hong ,  Cheng-Chung Li

IPC分类号： G02B5/02

摘要： Embodiments of an anti-glare article and methods for forming the same are disclosed. In one or more embodiments, the anti-glare article includes a substrate having a surface, and a plurality of features disposed on the surface, wherein about 50% or more of the plurality of features comprise a normalized area in the range from about 0.5 to about 1.5, and the normalized area is defined as the relationship (surface area of a feature/average surface area of all features). In some embodiments, about 90% or more of the features have a surface area of about 100 micrometers or less. The anti-glare article exhibits a PPDr of about 5% or less, a transmission haze of less than about 20% and a DOI of less than about 90%. Methods of forming the substrate are also disclosed and include etching a surface of a substrate with an etchant comprising a water soluble metal ion salt.

公开(公告)号：US10690818B2

公开(公告)日：2020-06-23

申请号：US15508307

申请日：2015-09-04

申请人： CORNING INCORPORATED

发明人： Haixing Chen ,  Ling Chen ,  Haofei Gong ,  Liping Hong ,  Cheng-Chung Li

IPC分类号： G02B5/02 ,  G02B1/12

摘要： Embodiments of an anti-glare article and methods for forming the same are disclosed. In one or more embodiments, the anti-glare article includes a substrate having a surface, and a plurality of features disposed on the surface, wherein about 50% or more of the plurality of features comprise a normalized area in the range from about 0.5 to about 1.5, and the normalized area is defined as the relationship (surface area of a feature/average surface area of all features). In some embodiments, about 90% or more of the features have a surface area of about 100 micrometers or less. The anti-glare article exhibits a PPDr of about 5% or less, a transmission haze of less than about 20% and a DOI of less than about 90%. Methods of forming the substrate are also disclosed and include etching a surface of a substrate with an etchant comprising a water soluble metal ion salt.

公开(公告)号：US10364180B2

公开(公告)日：2019-07-30

申请号：US15539472

申请日：2016-01-06

申请人： CORNING INCORPORATED

发明人： Baifeng Chen ,  Haixing Chen ,  Ling Chen ,  Haofei Gong ,  Jun Hou

IPC分类号： C03C15/00

摘要： An apparatus for producing anti-glare surfaces includes an etching cream dipping tank and a sub-tank arranged to receive a slurry of etching cream. A pumping unit is fluidly coupled to the etching cream dipping tank and the sub-tank such that the pumping unit is operable to selectively self-circulate the slurry of etching cream in the sub-tank to improve homogeneity of the etching cream and transfer a volume of the homogenized etching cream from the sub-tank to the etching cream dipping tank.