公开(公告)号：US20200371446A1

公开(公告)日：2020-11-26

申请号：US15930443

申请日：2020-05-13

Applicant: Dexerials Corporation

Inventor： Asahiko NOGAMI

IPC: G03F7/20

Abstract: An exposure apparatus 10 includes an optical pickup 12 configured to emit laser light and being capable of adjusting the focus of the laser light, a control computing unit 16 configured to adjust the focus of the laser light, an auxiliary stage 21 having the light source unit 12 set thereon, the position of the auxiliary stage 21 being adjustable in the direction toward the master 1, an auxiliary stage control unit 25 configured to control the position of the auxiliary stage 21, wherein the optical pickup 12 includes an object lens 124 configured to direct the laser light to the master 1, a VCM actuator 125 configured to displace the object lens 124 in accordance with a drive current, and the auxiliary stage control unit 25 controls the position of the auxiliary stage 21 in accordance with the drive current for the VCM actuator 125.

公开(公告)号：US20180224578A1

公开(公告)日：2018-08-09

申请号：US15771960

申请日：2016-10-04

Applicant: DEXERIALS CORPORATION

Inventor： Shunichi KAJIYA ,  Asahiko NOGAMI ,  Kyoko SAKURAI ,  Kazuya HAYASHIBE

IPC: G02B1/118

CPC classification number: G02B1/118

Abstract: There is provided an optical body and a display device that enable wavelength dependence of a reflectance to be reduced and reflection of incident light to be further suppressed, the optical body including: a concave-convex structure formed on a surface of a base material. An average period of concavities and convexities of the concave-convex structure is equal to or shorter than a wavelength belonging to a visible light band. A standard deviation of differences between respective positions of bottom faces of the concavities of the concave-convex structure in a normal direction of a flat surface of the base material and a median of the positions of the bottom faces is greater than or equal to 25 nm.