DETERMINING WIDTH AND HEIGHT OF ELECTRON SPOT

    公开(公告)号:US20210249215A1

    公开(公告)日:2021-08-12

    申请号:US16973497

    申请日:2019-06-24

    Applicant: Excillum AB

    Abstract: A method in an X-ray source configured to emit, from an interaction region, X-ray radiation generated by an interaction between an electron beam and a target, the method including the steps of: providing the target; providing the electron beam; deflecting the electron beam along a first direction relative the target; detecting electrons indicative of the interaction between the electron beam and the target; determining a first extension of the electron beam on the target, along the first direction, based on the detected electrons and the deflection of the electron beam; detecting X-ray radiation generated by the interaction between the electron beam and the target; and determining a second extension of the electron beam on the target, along a second direction, based on the detected X-ray radiation.

Patent Agency Ranking