公开(公告)号：US10766225B2

公开(公告)日：2020-09-08

申请号：US16583293

申请日：2019-09-26

Applicant: FUJIFILM CORPORATION

Inventor： Tatsuya Yoshihiro

IPC: B32B15/04 ,  B32B17/06 ,  B32B7/023 ,  B32B15/01 ,  E06B3/30

Abstract: Provided are a laminate including a substrate; and a laminated structure including two or more kinds of layers having different specific acoustic impedances which is disposed on the substrate, in which the number of the layers constituting the laminated structure is 10 or more, a thickness of a layer having the largest thickness among the layers constituting the laminated structure is 8 nm or less, and in the laminated structure, a CV value defined by a standard deviation of a layer thickness/average layer thickness is 0.05 or more, and a building material, a window material, and a radiation cooling device including the laminate.

公开(公告)号：US10473821B2

公开(公告)日：2019-11-12

申请号：US14850310

申请日：2015-09-10

Applicant: FUJIFILM Corporation

Inventor： Shinichiro Sonoda ,  Tatsuya Yoshihiro

IPC: G02B1/11 ,  C03C17/34 ,  G02B1/12 ,  G02B5/02 ,  G02B1/113 ,  G02B1/118

Abstract: A first light-shied-coating formation step that forms a light shield coating only in a part of an area of a transparent-substrate in which a light shield coating is to be formed, a step that deposits an optical thin film including, as its outermost layer, a layer to be hydrothermally treated, which will become a fine uneven pattern coating by being hydrothermally treated, in an area in which an antireflection coating is to be formed, a second light-shield-coating formation step that forms a light shield coating in all of the area in which the light shield coating is to be formed, but the light shield coating was not formed in the first light-shield-coating formation step, and a step that forms the fine uneven pattern coating in the area in which the antireflection coating is to be formed by hydrothermally treating the layer to be hydrothermally treated are performed in this order.

公开(公告)号：US10196302B2

公开(公告)日：2019-02-05

申请号：US15269275

申请日：2016-09-19

Applicant: FUJIFILM Corporation

Inventor： Shinichiro Sonoda ,  Tatsuya Yoshihiro

IPC: C03C17/34 ,  B32B9/00 ,  G02B1/115 ,  G02B1/118 ,  B32B5/14 ,  B32B15/20 ,  C03C17/245

Abstract: A dielectric multilayer film is formed on one surface of a lens main body, a film including aluminum is formed on the other surface of the lens main body, the film including aluminum is immersed in hot water without immersing the dielectric multilayer film in the hot water, thereby changing the film including aluminum to a fine uneven structure film including an alumina hydrate as a main component, whereby a lens provided with antireflection functions on both surfaces is manufactured.