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1.发明授权公开(公告)号：US11747520B2
公开(公告)日：2023-09-05
申请号：US16929100
申请日：2020-07-14
Applicant: FUJIFILM CORPORATION
Inventor： Kenichi Umeda , Seigo Nakamura , Tatsuya Yoshihiro , Yuichiro Itai
IPC: G02B1/115 , G02B1/116 , G02B5/28 , G02F1/1335
CPC classification number: G02B1/115 , G02B1/116 , G02B5/285 , G02F1/133502 , G02F2201/38
Abstract: The optical thin film is provided on a substrate and includes, in order, from the substrate side, an interlayer, a silver-containing metal layer, and a dielectric layer, in which an anchor region including an oxide of an anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the interlayer, a cap region including an oxide of the anchor metal is provided in an interface region of the silver-containing metal layer on a side close to the dielectric layer, a film thickness of the silver-containing metal layer is 6 nm or less, the silver-containing metal layer contains a high standard electrode potential metal, and a peak position of a concentration distribution of the high standard electrode potential metal in a film thickness direction of the silver-containing metal layer is positioned closer to the interlayer than a peak position of a silver concentration distribution.
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公开(公告)号：US11422290B2
公开(公告)日：2022-08-23
申请号：US16813703
申请日：2020-03-09
Applicant: FUJIFILM Corporation
Inventor： Seigo Nakamura , Tatsuya Yoshihiro , Kenichi Umeda , Yuichiro Itai
Abstract: An antireflection film is provided on a substrate and includes an interlayer, a silver-containing metal layer containing silver, and a dielectric layer, which are laminated in this order on a side of a substrate, in which the interlayer is a multilayer film having at least two layers in which a layer of high refractive index having a relatively high refractive index and a layer of lower refractive index having a relatively low refractive index are alternately laminated, the dielectric layer has a surface exposed to air, and the dielectric layer is a multilayer film including a silicon-containing oxide layer, a magnesium fluoride layer, and an adhesion layer provided between the silicon-containing oxide layer and the magnesium fluoride layer and configured to increase adhesiveness between the silicon-containing oxide layer and the magnesium fluoride layer.
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公开(公告)号：US10564323B2
公开(公告)日：2020-02-18
申请号：US15679557
申请日：2017-08-17
Applicant: FUJIFILM Corporation
Inventor： Tatsuya Yoshihiro , Tadashi Kasamatsu , Shinichiro Sonoda
Abstract: An antireflection film includes an uneven structure layer that has an uneven structure and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 8.5 μm−1 or greater and has a film thickness of 200-250 nm, and the intermediate layer comprises a plurality of layers including at least a first layer, a second layer, a third layer, and a fourth layer.
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公开(公告)号：US20200016864A1
公开(公告)日：2020-01-16
申请号：US16583293
申请日：2019-09-26
Applicant: FUJIFILM CORPORATION
Inventor： Tatsuya Yoshihiro
Abstract: Provided are a laminate including a substrate; and a laminated structure including two or more kinds of layers having different specific acoustic impedances which is disposed on the substrate, in which the number of the layers constituting the laminated structure is 10 or more, a thickness of a layer having the largest thickness among the layers constituting the laminated structure is 8 nm or less, and in the laminated structure, a CV value defined by a standard deviation of a layer thickness/average layer thickness is 0.05 or more, and a building material, a window material, and a radiation cooling device including the laminate.
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公开(公告)号：US10025006B2
公开(公告)日：2018-07-17
申请号：US15787440
申请日：2017-10-18
Applicant: FUJIFILM Corporation
Inventor： Hirotoshi Yoshizawa , Shinichiro Sonoda , Tatsuya Yoshihiro
Abstract: Provided is a method of manufacturing a structure having a transparent fine uneven structural body formed by hot water treatment, in which a finer uneven structure is formed. Provided is a method of manufacturing a structure, the method being for manufacturing a structure including a substrate, and a transparent fine uneven structural body which is formed on a surface of the substrate by hot water treatment, including: a first step of forming a precursor film of the transparent fine uneven structural body on the substrate; a second step of forming a fine uneven structure on a surface of the precursor film; and a third step of subjecting, to hot water treatment, the precursor film on which the fine uneven structure is formed to form the transparent fine uneven structural body in which a peak value ν0 of space frequency of the unevenness of the fine uneven structure formed in the second step satisfies ν
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Patent Agency Ranking
公开(公告)号：US10696015B2
公开(公告)日：2020-06-30
申请号：US16583291
申请日：2019-09-26
Applicant: FUJIFILM CORPORATION
Inventor： Tatsuya Yoshihiro , Takeharu Tani
Abstract: Provided is an optical member which includes: a substrate; and a laminated structure including two or more kinds of layers having different materials which are disposed on the substrate, in which the number of layers constituting the laminated structure is 10 or more, the maximum layer thickness of the layers constituting the laminated structure is 8 nm or less, and the minimum transmittance in a wavelength range of 400 nm to 800 nm or in a wavelength range of 6 μm to 12 μm is 10% or more.
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公开(公告)号：US10591190B2
公开(公告)日：2020-03-17
申请号：US16357258
申请日：2019-03-18
Applicant: FUJIFILM CORPORATION
Inventor： Tatsuya Yoshihiro , Hideki Yasuda
Abstract: A radiative cooling device including: a heat insulating container having an opening portion, and being configured to house an object to be cooled at an interior thereof and thermally insulates the object from an exterior thereof; a far-infrared radiator that is arranged between the object and the opening portion in the heat insulating container, that thermally contacts the object, and that radiates far-infrared rays in a wavelength range of from 8 μm to 13 μm; a far-infrared transmitting window member that closes at least part of the opening portion of the heat insulating container and that transmits the far-infrared rays radiated from the far-infrared radiator; and an intermediate heat insulating member that is arranged between the far-infrared transmitting window member and the far-infrared radiator, that thermally insulates the far-infrared transmitting window member and the far-infrared radiator from each other, and that transmits the far-infrared rays radiated from the far-infrared radiator.
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公开(公告)号：US10518501B2
公开(公告)日：2019-12-31
申请号：US15682782
申请日：2017-08-22
Applicant: FUJIFILM Corporation
Inventor： Shinichiro Sonoda , Tatsuya Yoshihiro
Abstract: An antireflection film includes an uneven structure layer that has an uneven structure in which a distance between protrusions is shorter than a wavelength of light of which reflection is to be suppressed and has an alumina hydrate as a main component, and an intermediate layer that is disposed between the uneven structure layer and a substrate. The uneven structure layer has a spatial frequency peak value of the uneven structure of 6.5 μm−1 or greater and a film thickness of 250 nm or more, and the intermediate layer is constituted of a plurality of layers including at least a first layer, a second layer, a third layer, a fourth layer, a fifth layer, a sixth layer, a seventh layer, and an eighth layer in this order from the uneven structure layer side to the substrate side.
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公开(公告)号：US10228492B2
公开(公告)日：2019-03-12
申请号：US15440195
申请日：2017-02-23
Applicant: FUJIFILM Corporation
Inventor： Shinichiro Sonoda , Tatsuya Yoshihiro , Hiroki Takahashi , Mototaka Kanaya
IPC: G02B1/118 , B32B7/02 , B32B9/00 , B32B3/30 , G02B1/115 , C23C14/06 , C23C14/08 , C23C14/34 , G02B27/00 , C03C17/34 , C23C14/00 , C23C14/58
Abstract: The antireflection film is provided on a surface of a light-transmitting substrate and includes a thin multi-layer film and a fine unevenness layer that are laminated in this order from the substrate side. The thin multi-layer film includes multiple layers. The fine unevenness layer has a structure in which an uneven structure having a shorter average pitch than a wavelength of used light is provided and in which a refractive index to the used light changes continuously depending on a continuous change in a space occupation of the uneven structure in a thickness direction of the thin multi-layer film. The multiple layers include: an oxide film having a relatively high refractive index that is formed of at least two metal elements or is formed of silicon and at least one metal element; and an oxynitride film having a relatively low refractive index.
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公开(公告)号：US10099317B2
公开(公告)日：2018-10-16
申请号：US15679650
申请日：2017-08-17
Applicant: FUJIFILM Corporation
Inventor： Shinya Hakuta , Shogo Yamazoe , Tatsuya Yoshihiro , Akihiko Ohtsu , Tadashi Kasamatsu , Masayuki Naya
IPC: E04B1/86 , B23K26/382 , G10K11/16 , B23K26/00 , G10K11/162
Abstract: A soundproof structure has one or more soundproof cells. Each of the one or more soundproof cells includes a frame having a through-hole, a film fixed to the frame, and an opening portion configured to include one or more holes drilled in the film. Neither end portions of the through-hole of the frame are closed. The soundproof structure has a shielding peak frequency, which is determined by the opening portion of each of the one or more soundproof cells and at which a transmission loss is maximized, on a lower frequency side than a first natural vibration frequency of the film of each of the one or more soundproof cells, and selectively insulates sound in a predetermined frequency band including the shielding peak frequency at its center. Accordingly, there is provided a soundproof structure that is light and thin, does not depend on the position and shape of a hole, has high robustness as a sound insulation material, is stable, has air permeability, has no heat, and is excellent in manufacturability, and a soundproof structure manufacturing method.
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