Abstract:
An optical waveguide device has a substrate, an intermediate layer, a thin-film LN layer containing an X-cut lithium niobate, and a buffer layer stacked on the substrate, and an optical waveguide having a ridge shape formed in the thin-film LN layer. The optical waveguide device includes a plurality of electrodes provided, respectively, at a first side and a second side of the optical waveguide. The electrodes are disposed so that respective bottom surfaces thereof are at positions lower than a position of a surface of the buffer layer.
Abstract:
An optical modulator includes an optical waveguide of a ridge type formed of a thin film of a dielectric material having an electro-optic effect over a substrate, a buffer layer covering the optical waveguide, and a signal electrode provided over the optical waveguide via the buffer layer, wherein a width of the signal electrode is greater than a ridge width of the optical waveguide and wherein the signal electrode covers at least one of sidewalls of a ridge of the optical waveguide.
Abstract:
An optical modulator includes: a ferroelectric substrate in which an input optical waveguide, first and second optical waveguides, and an output optical waveguide are formed; a first electrode formed in a vicinity of the first optical waveguide and to which a first DC voltage is applied; a second electrode formed in a vicinity of the second optical waveguide and to which a second DC voltage is applied; a third electrode electrically connected to the first electrode and formed on both sides of the second electrode; and a fourth electrode electrically connected to the second electrode and formed on both sides of the first electrode. A first gap between the first electrode and the fourth electrode is approximately the same as a second gap between the second electrode and the third electrode. A gap between the third electrode and the fourth electrode is 1-5 times greater than the first gap.