公开(公告)号：US06961920B2

公开(公告)日：2005-11-01

申请号：US10665996

申请日：2003-09-18

申请人： Franz Xaver Zach

发明人： Franz Xaver Zach

IPC分类号： G03F1/08 ,  G03F1/14 ,  G06F17/50 ,  H01L21/027

CPC分类号： G03F1/36 ,  G03F7/70441

摘要： An optical proximity correction method is provided using a modified merit function based upon yield. Known failure mechanisms related to layout geometries are used to derive yield functions based upon distance values between layout features, such as, edge features. In comparing the edge points on the predicted layout pattern with the corresponding point on the design layout pattern, a yield test is first undertaken before movement of the points on the predicted layout pattern to a position of higher yield. Where yield is acceptable, no further movement is made. Where incremental movement of points results in coming within acceptable proximity before acceptable yield is reached, the point is flagged for further consideration.