公开(公告)号：US20220059315A1

公开(公告)日：2022-02-24

申请号：US17518739

申请日：2021-11-04

Applicant: Hitachi High-Tech Corporation

Inventor： Takuma YAMAMOTO

IPC: H01J37/22 ,  H01J37/244

Abstract: Even when the amount of overlay deviation between patterns located in different layers is large, correct measurement of the amount of overlay deviation is stably performed. The charged particle beam device includes a charged particle beam irradiation unit that irradiates a sample with a charged particle beam, a first detection unit that detects secondary electrons from the sample, a second detection unit that detects backscattered electrons from the sample, and an image processing unit that generates a first image including an image of a first pattern located on the surface of the sample based on an output of the first detection unit, and generates a second image including an image of a second pattern located in a lower layer than the surface of the sample based on an output of the second detection unit. A control unit adjusts the position of a measurement area in the first image based on a first template image for the first image, and adjusts the position of a measurement area in the second image based on a second template image for the second image.

公开(公告)号：US20230343548A1

公开(公告)日：2023-10-26

申请号：US18333637

申请日：2023-06-13

Applicant: Hitachi High-Tech Corporation

Inventor： Takuma YAMAMOTO

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J37/28

Abstract: Even when the amount of overlay deviation between patterns located in different layers is large, correct measurement of the amount of overlay deviation is stably performed. The charged particle beam device includes a charged particle beam irradiation unit that irradiates a sample with a charged particle beam, a first detection unit that detects secondary electrons from the sample, a second detection unit that detects backscattered electrons from the sample, and an image processing unit that generates a first image including an image of a first pattern located on the surface of the sample based on an output of the first detection unit, and generates a second image including an image of a second pattern located in a lower layer than the surface of the sample based on an output of the second detection unit. A control unit adjusts the position of a measurement area in the first image based on a first template image for the first image, and adjusts the position of a measurement area in the second image based on a second template image for the second image.

公开(公告)号：US20210225608A1

公开(公告)日：2021-07-22

申请号：US15734367

申请日：2018-06-14

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Takahiro NISHIHATA ,  Mayuka OSAKI ,  Wei SUN ,  Takuma YAMAMOTO

IPC: H01J37/21 ,  H01J37/22 ,  H01J37/244

Abstract: In the present invention, an electro-optical condition generation unit includes: a condition setting unit that sets, as a plurality of electro-optical conditions, a plurality of electro-optical conditions in which the combinations of the aperture angle and the focal-point height for an electron beam are different; an index calculating unit that determines a measurement-performance index in the electro-optical conditions set by the condition setting unit; and a condition deriving unit that derives an electro-optical condition, including an aperture angle and a focal-point height, so that the measurement-performance index determined by the index calculating unit becomes a prescribed value.