公开(公告)号：US20130115779A1

公开(公告)日：2013-05-09

申请号：US13662078

申请日：2012-10-26

Applicant: Intermolecular, Inc.

Inventor： Gregory P. Lim ,  Jeffrey Chih-Hou Lowe ,  Sandeep Mariserla ,  Robert Anthony Sculac

IPC: H01L21/306 ,  H01L21/308

CPC classification number: H01L21/67057 ,  H01L21/67086 ,  H01L21/67126

Abstract: In some embodiments, the present invention discloses sealing mechanisms for generating site isolated regions on a substrate, allowing combinatorial processing without cross contamination between regions. The sealing mechanism can include a thin sharp edge ring for pressing on the substrate surface with small contact area. The small sealing area can concentrate the sealing force, generating higher contact pressure to guard against fluid leakage across the sealing surface, for example, eliminating fluid wicking at the seal interface through capillary action. The sealing mechanism can include multiple protrusions, which contacts the substrate leaving a small gap at the remaining portion of the sealing mechanism. The sealing mechanism can include minimal contact points with the substrate, which can significantly reduce the particle generation during processing. A pressure differential can be established across the sealing surface to prevent fluid leakage.

Abstract translation: 在一些实施例中，本发明公开了用于在基底上产生位置隔离区域的密封机构，允许组合处理，而不会在区域之间产生交叉污染。 密封机构可以包括用于以小的接触面积压在基板表面上的薄的尖锐边缘环。 小密封区域可以集中密封力，产生更高的接触压力，以防止渗透密封表面的流体泄漏，例如，通过毛细作用消除密封界面处的流体芯吸。 密封机构可以包括多个突起，其与衬底接触，在密封机构的剩余部分处留下小间隙。 密封机构可以包括与基底的最小接触点，这可显着减少加工期间的颗粒产生。 可以跨越密封表面建立压力差，以防止流体泄漏。