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11.
公开(公告)号:US4663009A
公开(公告)日:1987-05-05
申请号:US699969
申请日:1985-02-08
申请人: Darrel R. Bloomquist , George A. Drennan , Robert J. Lawton , James E. Opfer , Michael B. Jacobson
发明人: Darrel R. Bloomquist , George A. Drennan , Robert J. Lawton , James E. Opfer , Michael B. Jacobson
CPC分类号: H01L21/67748 , C23C14/14 , C23C14/568 , H01L21/67126 , H01L21/67173 , H01L21/67207 , H01L21/67751
摘要: A sealed substrate processing path has plural selectably isolatable vacuum deposition chambers along the path. A transporter carries substrates along the path and an independently controllable sputter deposition is performed in each deposition chamber on substrates therein. Substrates are loaded from a load chamber to a first deposition chamber while a vacuum is maintained in the first and load chambers. Substrates are transferred from a last deposition chamber to an unload chamber while a vacuum is maintained in the last and load chambers. Substrates are placed in the load chamber while the load and first chambers are isolated and are removed from the unload chamber while the last and unload chambers are isolated. In one embodiment, substrates travel succesively from the load chamber to first through fourth deposition chambers and then to the unload chamber. In another embodiment, substrates travel from the load chamber to first to second to first and to third deposition chambers and then to the unload chamber. First and second alternating load chambers are provided in another embodiment with substrates being loaded into the second load chamber while substrates are transferred from the first load chamber to the first deposition chamber and vice versa. The respective first and second load chambers are coupled through an interface chamber to the first deposition chamber and are each isolatable from the interface chamber during loading.
摘要翻译: 密封的基板处理路径沿着路径具有多个可选择地分离的真空沉积室。 输送器沿着路径承载基板,并且在其中的基板上的每个沉积室中执行独立可控的溅射沉积。 将衬底从负载室装载到第一沉积室,同时在第一和负载室中保持真空。 衬底从最后的沉积室转移到卸载室,同时在最后和负载室中保持真空。 衬底被放置在负载室中,同时负载和第一室被隔离并且在最后和卸载室被隔离时从卸载室移除。 在一个实施例中,衬底从负载室继续行进到第一至第四沉积室,然后到达卸载室。 在另一个实施例中,衬底从负载室行进到第一到第二到第三沉积室,然后到卸载室。 在另一实施例中提供了第一和第二交替负载室,其中衬底被装载到第二负载室中,而衬底从第一负载室转移到第一沉积室,反之亦然。 相应的第一和第二加载室通过界面室耦合到第一沉积室,并且在加载期间各自与界面室分离。
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公开(公告)号:US20080299680A1
公开(公告)日:2008-12-04
申请号:US12187833
申请日:2008-08-07
IPC分类号: H01L21/00
CPC分类号: G11C11/15
摘要: Methods for creating a memory device can include depositing a sense layer, patterning the sense layer to form a plurality of magnetic data cells, depositing a separation layer over the plurality of data cells, depositing a reference layer over the separation layer, and patterning the reference layer to form an elongated magnetic reference cell wherein the elongated magnetic reference cell extends uninterrupted along more than one of the plurality of magnetic data cells.
摘要翻译: 用于创建存储器件的方法可以包括沉积感测层,图案化感测层以形成多个磁性数据单元,在多个数据单元上沉积分离层,在分离层上沉积参考层, 以形成细长的磁性参考单元,其中细长磁性参考单元沿多个磁性数据单元中的一个以上不间断地延伸。
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公开(公告)号:US06657890B1
公开(公告)日:2003-12-02
申请号:US10176715
申请日:2002-06-21
申请人: Darrel R. Bloomquist
发明人: Darrel R. Bloomquist
IPC分类号: G11C1115
CPC分类号: G11C11/15
摘要: A magnetic memory device has a plurality of write lines and a plurality of memory cells. Each of the plurality of memory cells are operatively positioned between a corresponding pair of the plurality of write lines. Each of the plurality of memory cells has a sense layer and a reference layer separated by an insulating layer. The reference layer of each of the plurality of memory cells includes a high coercivity permanent magnet.
摘要翻译: 磁存储器件具有多个写入线和多个存储单元。 多个存储单元中的每一个可操作地位于相应的一对多条写入线之间。 多个存储单元中的每一个具有由绝缘层分隔开的感测层和参考层。 多个存储单元中的每一个的参考层包括高矫顽力永磁体。
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公开(公告)号:US4834855A
公开(公告)日:1989-05-30
申请号:US112006
申请日:1987-10-15
CPC分类号: H01J37/3429 , C23C14/3407 , C23C14/3414 , C23C14/564 , H01J37/34 , H01J37/3426
摘要: A sputtering target has a sputtering surface with first and second regions of respective first and second materials. The first region comprises a surface of a first member of the first material, such as of a circular cobalt plate. The second region comprises a surface of a second member of the second material, such as a platinum ring. A cobalt cover ring clamps the platinum ring to the cobalt plate. By varying the relative sizes of the first and second regions, as by changing the size of the cover ring to expose more or less of the platinum ring, the concentration of the two materials in a layer deposited from the target onto substrates is varied. In addition, by imparting planetary motion to substrates during deposition and sizing and positioning the exposed portion of the platinum ring, a radial coercivity gradient is established in the layer deposited on the substrates.
摘要翻译: 溅射靶具有具有相应的第一和第二材料的第一和第二区域的溅射表面。 第一区域包括第一材料的第一构件的表面,例如圆形钴板。 第二区域包括第二材料的第二构件的表面,例如铂环。 钴盖环将铂环夹在钴板上。 通过改变第一和第二区域的相对尺寸,通过改变盖环的尺寸以暴露更多或更少的铂金环,从靶材沉积到基底上的层中的两种材料的浓度是变化的。 此外,通过在沉积期间将基板施加行星运动并使铂环的暴露部分定位和定位,在沉积在基板上的层中建立了径向矫顽力梯度。
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公开(公告)号:US4626336A
公开(公告)日:1986-12-02
申请号:US730700
申请日:1985-05-02
CPC分类号: H01J37/3429 , C23C14/3407 , C23C14/3414 , C23C14/564 , H01J37/34 , H01J37/3426
摘要: A sputtering target has a sputtering surface with first and second regions of repsective first and second materials. The first region comprises a surface of a first member of the first material, such as of a circular cobalt plate. The second region comprises a surface of a second member of the second material, such as a platinum ring. A cobalt cover ring clamps the platinum ring to the cobalt plate. By varying the relative sizes of the first and second regions, as by changing the size of the cover ring to expose more or less of the platinum ring, the concentration of the two materials in a layer deposited from the target onto substrates is varied. In addition, by imparting planetary motion to substrates during deposition and sizing and positioning the exposed portion of the platinum ring, a radial coercivity gradient is established in the layer deposited on the substrates.
摘要翻译: 溅射靶具有具有第一和第二区域的第一和第二材料的溅射表面。 第一区域包括第一材料的第一构件的表面,例如圆形钴板。 第二区域包括第二材料的第二构件的表面,例如铂环。 钴盖环将铂环夹在钴板上。 通过改变第一和第二区域的相对尺寸,通过改变盖环的尺寸以暴露更多或更少的铂金环,从靶材沉积到基底上的层中的两种材料的浓度是变化的。 此外,通过在沉积期间将基板施加行星运动并使铂环的暴露部分定位和定位,在沉积在基板上的层中建立了径向矫顽力梯度。
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