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公开(公告)号:US20190207579A1
公开(公告)日:2019-07-04
申请号:US15933213
申请日:2018-03-22
Applicant: Lam Research Corporation
Inventor: Sean Kelly O'Brien , Seyed Jafar Jafarian-Tehrani , Hema Swaroop Mopidevi , Neil Martin Paul Benjamin , Jason Augustino
Abstract: Various embodiments include an apparatus to filter radio-frequencies in a plasma-based processing device. In various embodiments, an RF filter device includes a number of substantially-planar spiral-filters electrically coupled to and substantially parallel to each other in a spaced-apart arrangement. In one embodiment, each of the planar spiral-filters is coupled to an adjacent one of the planar spiral filters as either an inside-to-inside electrical connection or an outside-to-outside electrical connection based on an arrangement of the successive spirals so as to increase a total value of inductance. Other methods, devices, apparatuses, and systems are disclosed.
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公开(公告)号:US12283462B2
公开(公告)日:2025-04-22
申请号:US18000895
申请日:2021-06-07
Applicant: Lam Research Corporation
Inventor: Hema Swaroop Mopidevi , Lee Chen , Thomas W. Anderson , Shaun Tyler Smith , Neil M. P. Benjamin
IPC: H01J37/32
Abstract: An apparatus for forming a plasma may include one or more coupling ports to accept a radiofrequency (RF) current. The apparatus may additionally include one or more coupling structures which may include one or more conductive loops to permit the RF current to conduct from at least a first portion of the one or more coupling ports to at least a second port of the one or more coupling ports. The one or more conductive loops may each be configured to exhibit a first value of inductance in the absence of the plasma and to exhibit a second value of inductance in the presence of the plasma. The one or more coupling structures may each include a reactive element, in which each reactive element is coupled to a corresponding one of the one or more conductive loops so as to form a corresponding number of coupling structures. Each RF coupling structure may have a resonant frequency that increases in response to the presence of the plasma.
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公开(公告)号:US11177067B2
公开(公告)日:2021-11-16
申请号:US16045635
申请日:2018-07-25
Applicant: Lam Research Corporation
Inventor: Hema Swaroop Mopidevi , Neil Martin Paul Benjamin , John Pease , Thomas Anderson
IPC: H01J37/32 , H01L21/683 , H01F27/36 , H01F27/34
Abstract: In some examples, a magnetic shield for a plasma source is provided. An example magnetic shield comprises a back-shell. The back-shell includes a cage defined, at least in part, by an arrangement of bars of ferro-magnetic material. The cage is sized and configured to at least extend over a top side of an RF source coil for the plasma source.
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公开(公告)号:US10460914B2
公开(公告)日:2019-10-29
申请号:US15828258
申请日:2017-11-30
Applicant: Lam Research Corporation
Inventor: Hema Swaroop Mopidevi , John Pease , Thomas W. Anderson , Neil M. P. Benjamin
IPC: H01J37/32 , H01L21/67 , H02J50/12 , H01L21/683
Abstract: RF isolation for power circuitry includes one or more ferrite cages surrounding a pair of coils, one coil connected to power input, and the other coil connected to a load such as a heater. The ferrite cage provides universal isolation for the coils, avoiding the necessity of specially tuned filters or more complicated coil arrangements. A pair of dielectric discs support respective coils. In one aspect, the ferrite cage is constituted by ferrite pieces which fan out from a central portion of the dielectric discs and are connected at an outer periphery of the dielectric discs, and at the central portion of the dielectric discs. In one aspect, the fanned-out ferrite pieces comprises either manganese-zinc or magnesium-zinc ferrites, and the ferrite pieces connecting the fanned-out ferrite pieces comprise nickel-zinc ferrites.
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