Photochemical method for manufacturing nanometrically surface-decorated substrates
    11.
    发明授权
    Photochemical method for manufacturing nanometrically surface-decorated substrates 失效
    用于制造纳米表面装饰基材的光化学方法

    公开(公告)号:US07655383B2

    公开(公告)日:2010-02-02

    申请号:US11510276

    申请日:2006-08-24

    Abstract: The present invention relates to a photochemical method for manufacturing nanometrically surface-decorated substrates, i.e. the creation of periodic and aperiodic patterns of highly ordered inorganic nanostructures on a substrate. This method is based on the selective photochemical modification of a self-assembled monolayer of metal compound loaded polymer core-shell systems on widely variable substrates. Light exposure through an appropriate mask causes selective chemical modification of the polymer core shell system. By subsequently placing the substrate in an appropriate chemical solution that eradicates the non-modified polymer, the pattern given by the used mask is reproduced on the surface. Finally, the remaining organic matrix is removed and metal salt is transformed to the single metal or metal oxide nanodots by means of gas plasma treatment.

    Abstract translation: 本发明涉及一种用于制造纳米表面装饰的衬底的光化学方法,即在衬底上产生高度有序的无机纳米结构的周期性和非周期性图案。 该方法基于在广泛变化的基底上的金属化合物负载的聚合物核 - 壳体系的自组装单层的选择性光化学修饰。 通过适当的掩模的曝光导致聚合物核壳体系统的选择性化学改性。 通过随后将衬底放置在消除未改性聚合物的合适的化学溶液中,使用的掩模给出的图案在表面上再现。 最后,除去剩余的有机基质,通过气体等离子体处理将金属盐转变成单一金属或金属氧化物纳米点。

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