Substrate processing apparatus
    11.
    发明申请
    Substrate processing apparatus 审中-公开
    基板加工装置

    公开(公告)号:US20060219274A1

    公开(公告)日:2006-10-05

    申请号:US11401668

    申请日:2006-03-27

    申请人: Tomomi Iwata

    发明人: Tomomi Iwata

    IPC分类号: B08B3/10

    摘要: A dry-air supplying duct and a dry-air exhaust duct are opposite each other across a processing tank. Inside the dry-air supplying duct, a plurality of ventilation guides are provided that extend horizontally by a predetermined length from an end of the dry-air supplying duct, and a plurality of ventilation paths are formed by the plurality of ventilation guides. To an end of the dry-air supplying duct, a partition plate is attached such that it blocks a part of the plurality of ventilation paths. Also inside the dry-air supplying duct, a partition plate is attached such that it blocks a part of the plurality of ventilation paths. These partition plates are disposed in upper part of the dry-air supplying duct. As a result, an opening for injection of dry air is formed in a lower part of the dry-air supplying duct.

    摘要翻译: 干燥空气供给管道和干燥空气排出管道在处理槽中彼此相对。 在干燥空气供给管道的内部,设置有从干燥空气供给管道的端部水平延伸预定长度的多个通气引导件,并且由多个通气引导件形成多个通气路径。 在干燥空气供给管道的一端,安装有分隔板,从而阻挡多个通气路径的一部分。 此外,在干燥空气供给管道的内部,分隔板被安装成阻挡多个通气路径的一部分。 这些分隔板设置在干燥空气供给管道的上部。 结果,在干燥空气供给管道的下部形成有用于喷射干燥空气的开口。