专利检索 ap:("Norbertus Benedictus Koster" OR "Bastiaan Matthias Mertens" OR "Martinus Hendrikus Antonius Leenders" OR "Vladimir Vital′evitch Ivanov" OR "Konstantin Nikolaevitch Koshelev" OR "Vadim Yevgenyevich Banine") AND inv:"Bastiaan Matthias Mertens" 第 2 页

11.

发明授权
Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system 有权
标题翻译：用于清洁光刻投影装置的部件的表面的方法，光刻投影装置，装置制造方法和清洁系统

公开(公告)号：US07116394B2

公开(公告)日：2006-10-03

申请号：US10738976

申请日：2003-12-19

申请人： Levinus Pieter Bakker , Ralph Kurt , Bastiaan Matthias Mertens , Markus Weiss , Johann Trenkler , Wolfgang Singer

发明人： Levinus Pieter Bakker , Ralph Kurt , Bastiaan Matthias Mertens , Markus Weiss , Johann Trenkler , Wolfgang Singer

IPC分类号： G03B27/52 , G03B27/42

CPC分类号： G03F7/70916 , B08B6/00 , B08B7/0035 , G03F7/70925

摘要： A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.

摘要翻译： 公开了一种用于去除光刻投影装置中的部件表面的至少一部分的污染物的清洁系统。清洁系统包括产生电场以在组件的表面附近提供清洁颗粒的电场发生器。