公开(公告)号：US20180345210A1

公开(公告)日：2018-12-06

申请号：US15956373

申请日：2018-04-18

Applicant: Panasonic Intellectual Property Management Co., Ltd.

Inventor： GAKU MIYAKE ,  GENICHIRO MATSUDA ,  TAKAHIRO KITAI ,  YOSHIO YAMADA

IPC: B01D53/18 ,  H05H1/24 ,  B01D53/32 ,  B01D17/12 ,  B01D3/34 ,  B01D17/02

Abstract: Plasma is generated in a gas phase in a processing tub to produce a reforming component, the produced reforming component is dissolved in a liquid and is dispersed in the liquid to produce a reforming liquid, the produced reforming liquid is discharged from the processing tub to be stored in the storage tub, and gas is supplied from a gas supplier into the reforming liquid in the storage tub. The supplied gas has a bubble shape, comes into contact with the reforming liquid stored in the storage tub, and is deodorized.