Substrate processing methods and apparatus

    公开(公告)号:US12297535B2

    公开(公告)日:2025-05-13

    申请号:US17615171

    申请日:2019-06-06

    Applicant: Picosun Oy

    Abstract: A method and a substrate processing apparatus including a vertical flow reaction chamber, a flow guiding part and a substrate support at a horizontally central area of the reaction chamber, the substrate support residing underneath the flow guiding part, and the flow guiding part forcing the vertical flow from above the flow guiding part to go round the flow guiding part on its downward way towards the substrate support.

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