公开(公告)号：US11761082B2

公开(公告)日：2023-09-19

申请号：US16609000

申请日：2017-05-02

Applicant: Picosun Oy

Inventor： Marko Pudas

IPC: C23C16/455 ,  C23C16/44 ,  F16K1/44

CPC classification number: C23C16/45544 ,  C23C16/4402 ,  C23C16/4405 ,  C23C16/4408 ,  C23C16/4557 ,  C23C16/45519 ,  C23C16/45557 ,  C23C16/45561 ,  C23C16/45589 ,  F16K1/446

Abstract: An apparatus, a method and a valve with a reactive chemical inlet, a reaction chamber outlet, and a closure having an open and closed configuration to open and close, respectively, a route from the reactive chemical inlet to the reaction chamber outlet, the valve further including an additional cleaning chemical inlet at a downstream side of the closure to purge the closure.

公开(公告)号：US11261526B2

公开(公告)日：2022-03-01

申请号：US16331738

申请日：2016-09-16

Applicant: Picosun Oy

Inventor： Marko Pudas

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/442

Abstract: An atomic layer deposition (ALD) method in an ALD reactor including a reaction chamber housing a substrate vessel, and an isolated vibration source outside of the reaction chamber or isolated within the reaction chamber. Particulate material within the substrate vessel is coated by self-saturating surface reactions using a top-to-bottom precursor flow passing through the substrate vessel, and movements are caused in the particulate material within the substrate vessel by the isolated vibration source while coating the particulate material.

公开(公告)号：US11992425B2

公开(公告)日：2024-05-28

申请号：US16832300

申请日：2020-03-27

Applicant: PICOSUN OY

Inventor： Marko Pudas ,  Niku Oksala

IPC: A61F2/82

CPC classification number: A61F2/82 ,  A61F2210/0004 ,  A61F2220/005 ,  A61F2240/001 ,  A61F2250/0031 ,  A61F2250/0067

Abstract: A structure is provided comprising a number of surfaces 10, 20 joined together with an adhesive 30, said structure being configured to reshape upon at least partial degradation of the adhesive 30. Related method and uses are further provided.

公开(公告)号：US11976989B2

公开(公告)日：2024-05-07

申请号：US16832161

申请日：2020-03-27

Applicant: Picosun Oy

Inventor： Marko Pudas ,  Jani Kivioja ,  Niku Oksala

IPC: G01L1/22 ,  A61B5/00 ,  A61B17/84 ,  A61B17/86 ,  H05K3/46 ,  A61B17/00

CPC classification number: G01L1/2287 ,  A61B5/002 ,  A61B5/4851 ,  A61B17/846 ,  A61B17/86 ,  H05K3/4644 ,  A61B2017/0003 ,  A61B2017/00221 ,  A61B2562/0261 ,  A61B2562/12

Abstract: A strain sensor that includes a first atomic layer deposition layer, a flexible molecular layer deposition layer on top of the first atomic layer deposition layer, and a second atomic layer deposition layer on top of the molecular layer deposition layer.

公开(公告)号：US11759100B2

公开(公告)日：2023-09-19

申请号：US16830329

申请日：2020-03-26

Applicant: PICOSUN OY

Inventor： Marko Pudas

IPC: A61B1/12 ,  A61B1/00 ,  A61L2/20 ,  C23C16/455

CPC classification number: A61B1/126 ,  A61B1/00103 ,  A61L2/20 ,  C23C16/45544 ,  A61L2202/24

Abstract: A method for cleaning a medical instrument and for detecting residue thereon is provided in which method a non-sterile or conventionally sterilized medical instrument is exposed to pressure below 100 hPa, and, subsequently, exposed to at least one gas reactive to the residue.

公开(公告)号：US11241316B2

公开(公告)日：2022-02-08

申请号：US16830918

申请日：2020-03-26

Applicant: PICOSUN OY

Inventor： Niku Oksala ,  Marko Pudas

IPC: A61F2/28 ,  A61B17/86

Abstract: A medical implant structure is provided comprising a substrate 10 with at least a first surface and a second surface that surfaces differ from one another with regard to at least one property in relation to biological material.

公开(公告)号：US10600058B2

公开(公告)日：2020-03-24

申请号：US14899871

申请日：2013-06-27

Applicant: PICOSUN OY

Inventor： Marko Pudas

IPC: G06Q30/00 ,  G09F3/00 ,  D21H21/44 ,  C23C16/455

Abstract: A method for applying an anti-counterfeit signature on a product, and an anti-counterfeit signature. The method includes selecting a substrate and a type of signature and forming a signature of the selected type on the substrate with atomic layer deposition, ALD, wherein forming the signature includes applying at least one layer having a predetermined property configured to be detected with an analysis method on the substrate by atomic layer deposition, ALD.

公开(公告)号：US12297535B2

公开(公告)日：2025-05-13

申请号：US17615171

申请日：2019-06-06

Applicant: Picosun Oy

Inventor： Juhana Kostamo ,  Marko Pudas ,  Timo Malinen

IPC: C23C16/455

Abstract: A method and a substrate processing apparatus including a vertical flow reaction chamber, a flow guiding part and a substrate support at a horizontally central area of the reaction chamber, the substrate support residing underneath the flow guiding part, and the flow guiding part forcing the vertical flow from above the flow guiding part to go round the flow guiding part on its downward way towards the substrate support.

公开(公告)号：US12065730B2

公开(公告)日：2024-08-20

申请号：US16894160

申请日：2020-06-05

Applicant: PICOSUN OY

Inventor： Marko Pudas

IPC: C23C16/04 ,  B05C7/04 ,  B05C9/04 ,  B05C13/00 ,  C23C16/18 ,  C23C16/34 ,  C23C16/40 ,  C23C16/455

CPC classification number: C23C16/045 ,  B05C7/04 ,  B05C9/04 ,  B05C13/00 ,  C23C16/18 ,  C23C16/34 ,  C23C16/401 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45519 ,  C23C16/45544 ,  C23C16/45553 ,  C23C16/45521

Abstract: Chemical deposition reactor assembly configured for formation of coatings on surfaces of fluid-permeable materials, such as porous materials, by chemical deposition is provided, the reactor assembly includes a reaction chamber configured to receive, at least in part, a fluid-permeable substrate with a target surface to be coated; at least one reactive fluid intake line configured to mediate a flow of reactive fluid into the reaction chamber, and an inert fluid delivery arrangement with at least one enclosed section configured to mediate a flow of inert fluid through the substrate towards its' target surface such, that at the surface the flow of inert fluid encounters the flow of reactive fluid, whereby a coating is formed at the target surface of the fluid-permeable substrate.

公开(公告)号：US10982325B2

公开(公告)日：2021-04-20

申请号：US17029320

申请日：2020-09-23

Applicant: PICOSUN OY

Inventor： Juhana Kostamo ,  Timo Vähä-Ojala ,  Tom Blomberg ,  Marko Pudas

IPC: H01J37/32 ,  C23C16/455 ,  C23C16/515 ,  C23C16/44 ,  H01L39/24

Abstract: A thin-film deposition apparatus, related systems and methods are provided. The thin-film deposition apparatus 200 comprises a reaction chamber 201 for accommodating substrates 10 arranged with their side faces adjacent to each other and a fluid distribution device 100 with an expansion region 101 into which precursor fluid(s) enter via a number of inlets 103, and a transition region 102 for mixing said fluids. From the transition region, fluidic flow is directed into the reaction chamber 201 to propagate between the substrates 10 in a strictly laminar manner. By the invention, uniformity of precursor distribution on the substrates can be markedly improved.