公开(公告)号：US06977716B2

公开(公告)日：2005-12-20

申请号：US10833227

申请日：2004-04-28

Applicant: Harry Sewell ,  Jorge Ivaldi ,  John Shamaly

Inventor： Harry Sewell ,  Jorge Ivaldi ,  John Shamaly

IPC: G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G02B9/00 ,  G02B27/58

CPC classification number: G03F7/70225

Abstract: The present invention relates to a lithography apparatus and method using catadioptric exposure optics that projects high quality images without image flip. The apparatus includes means for illuminating a reticle stage to produce a patterned image. The apparatus also includes means for receiving the patterned image at each of a plurality of wafer stages. Each of the wafer stages has an associated data collection station. The apparatus also includes means for positioning the reticle stage substantially orthogonal to each of the plurality of wafer stages as well as means for directing the patterned image through a catadioptric exposure optics element between the reticle stage and each wafer stage to cause an even number of reflections of the patterned image and to project the patterned image onto each wafer stage in a congruent manner. The invention can also be combined with a dual isolation system.

Abstract translation: 本发明涉及一种使用反射折射曝光光学元件的光刻设备和方法，该光学装置和方法能够投射高质量的图像而无需图像翻转。 该装置包括用于照亮标线片台以产生图案化图像的装置。 该装置还包括用于在多个晶片级中的每一个处接收图案化图像的装置。 每个晶片台具有相关的数据采集台。 该装置还包括用于将标线片台基本上正交于多个晶片台中的每一个定位的装置以及用于引导图案化图像通过分划板台和每个晶片台之间的反射折射曝光光学元件的装置，以产生偶数次的反射 并且以均匀的方式将图案化图像投影到每个晶片台上。 本发明还可以与双隔离系统组合。

公开(公告)号：US06507390B1

公开(公告)日：2003-01-14

申请号：US09501180

申请日：2000-02-10

Applicant: Jorge Ivaldi

Inventor： Jorge Ivaldi

IPC: G03B2762

CPC classification number: G03F1/64 ,  G03F7/70933 ,  G03F7/70983

Abstract: A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system is described. A porous frame between a reticle and a pellicle maintains the purged optical gap. A porous frame includes a first and a second opposing surface. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. A gas supply interface infuses a purge gas through the porous frame and into the gap.

Abstract translation: 描述了一种用于在光刻系统中保持防护薄膜组件和掩模版之间的清除的光学间隙的方法和装置。 掩模版和防护薄膜组件之间的多孔框架保持被清除的光学间隙。 多孔框架包括第一和第二相对表面。 第一相对表面限定第一开口，并且被配置为与防护薄膜组合。 第二相对表面限定第二开口，并且被配置为与掩模版配合以包围防护薄膜组件和掩模版之间的光学间隙。 气体供应接口通过多孔框架注入吹扫气体并进入间隙。