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公开(公告)号：US06825916B2
公开(公告)日：2004-11-30
申请号：US10190347
申请日：2002-07-05
申请人： Brian Wiseman , Justin Strike
发明人： Brian Wiseman , Justin Strike
IPC分类号： G03B2762
CPC分类号： G03F7/70741 , G03B21/62 , G03F1/66 , G03F7/70983
摘要： A carrier for a reticle used in photolithographic semiconductor processing, having a base portion and a cover portion. The base portion has a plurality of reticle supports and a plurality of reticle positioning members. The cover portion is adapted to sealingly mate with the base portion, and has an inner surface with a plurality of spaced apart reticle restraints and a pair of reticle positioning tabs projecting inwardly therefrom. Each reticle positioning tab has a diagonal edge portion, and is oriented so that the diagonal edge portion urges a reticle resting on the reticle supports into engagement with the reticle restraints when the cover portion is mated with the base portion.
摘要翻译： 用于光刻半导体处理中的掩模版载体，具有基部和覆盖部分。 基部具有多个掩模版支架和多个标线片定位构件。 盖部分适于与基部密封地配合，并且具有内表面，其具有多个间隔开的掩模版约束件和从其向内突出的一对光罩定位片。 每个标线片定位突片具有对角边缘部分，并且被定向成使得当盖部分与基部配合时，对角边缘部分将搁置在掩模版支架上的光罩推向与标线保护装置接合。
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2.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US06819405B2
公开(公告)日：2004-11-16
申请号：US10136620
申请日：2002-05-03
IPC分类号： G03B2762
CPC分类号： G03F7/70558 , G03F7/70208 , G03F7/70466 , G03F7/70566
摘要： A lithographic projection apparatus including a first radiation system for providing a first projection beam of radiation; a second radiation system for providing a second projection beam of radiation; a support structure for supporting a first patterning structure and a second patterning structure, the first patterning structure serving to pattern the first projection beam according to a first pattern and the second patterning structure serving to pattern the second projection beam according to a second pattern; a substrate table for holding a substrate; a projection system for combining the first and second patterned beams and projecting the combined beam onto a target portion of the substrate.
摘要翻译： 一种光刻投影设备，包括用于提供第一投影辐射束的第一辐射系统; 用于提供第二投影辐射束的第二辐射系统; 用于支撑第一图案形成结构和第二图案形成结构的支撑结构，所述第一图案结构用于根据第一图案对第一投影光束进行图案，并且第二图案形成结构用于根据第二图案对第二投影光束进行图案化; 用于保持衬底的衬底台; 投影系统，用于组合第一和第二图案化束并将组合的光束投射到基板的目标部分上。
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公开(公告)号：US06590632B2
公开(公告)日：2003-07-08
申请号：US09977970
申请日：2001-10-17
申请人： Katsuto Sumi
发明人： Katsuto Sumi
IPC分类号： G03B2762
CPC分类号： H04N1/0614 , B41J2/465 , H04N1/06 , H04N1/195 , H04N2201/0426
摘要： The image recording method and apparatus focus or image a two-dimensional image formed by a group of two-dimensionally disposed light source elements through an optical system on a recording medium which is moving in a relative relation to the group two-dimensionally disposed light source elements. The method and apparatus deflect light from the group of two-dimensionally disposed light source elements to move the image focused on the recording medium in synchronism with a movement of the recording medium such that the image can remain stationary at least in a main scanning direction in a relative relation to the recording medium. The group of two-dimensionally disposed light source elements can be produced by a two-dimensional spatial light modulator illuminated with an illumination light flux.
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4.发明授权公开(公告)号：US06381005B1
公开(公告)日：2002-04-30
申请号：US09066836
申请日：1998-04-28
申请人： Kazuyuki Kasumi , Takeshi Miyachi
发明人： Kazuyuki Kasumi , Takeshi Miyachi
IPC分类号： G03B2762
CPC分类号： G03F7/707 , G03F7/70783
摘要： An exposure device for transferring a pattern on a mask onto a wafer. The exposure device includes a frame for supporting the mask, a mask holding device including a correction mechanism for correcting the pattern on the mask by applying force to the mask frame, and a device for changing at least one of the attitude and position of the correction mechanism, in accordance with the attitude of the mask. The positional relationship between the correction mechanism and the mask does not vary even if the attitude of the mask is changed to adjust the exposure gap between the wafer and the mask. Accordingly, the amount of change in magnification to be corrected can be kept constant and precise magnification correction can be achieved.
摘要翻译： 一种用于将掩模上的图案转印到晶片上的曝光装置。 曝光装置包括用于支撑掩模的框架，掩模保持装置，其包括用于通过向掩模框架施加力来校正掩模上的图案的校正机构，以及用于改变校正的姿态和位置中的至少一个的装置 机制，按照面具的态度。 即使改变掩模的姿态来调节晶片和掩模之间的曝光间隙，校正机构和掩模之间的位置关系也不变化。 因此，可以将要校正的倍率变化量保持恒定，并且可以实现精确的倍率校正。
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公开(公告)号：US06320650B1
公开(公告)日：2001-11-20
申请号：US09468024
申请日：1999-12-20
IPC分类号： G03B2762
CPC分类号： H04N1/00795 , H04N1/10 , H04N2201/0422
摘要： A method and apparatus for capturing an image. The apparatus includes a support platen for receiving a document having a front image bearing side and a back side co-extensive with the front side. An image capture element is disposed below the platen for capturing an image on the front image side. A reticle forming device is provided for providing a reticle on the platen for assisting in positioning of the document when a positioning cover is placed over the document. A second cover is also provided for placement over the positioning cover. The second cover is substantially opaque and is used for when the image on the front image side is illuminating for capture of the image.
摘要翻译： 一种用于捕获图像的方法和装置。 该装置包括用于接收具有正面图像承载侧和与前侧共同延伸的后侧的文档的支撑台板。 图像捕获元件设置在压板下方，用于捕捉正面像侧的图像。 提供了一种掩模版形成装置，用于在定位盖放置在文件上方时，用于在压板上提供掩模版以帮助定位文件。 还提供了第二个盖子用于放置在定位盖上。 第二盖基本上是不透明的，并且用于当正面图像侧的图像被照亮以捕获图像时。
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公开(公告)号：US06215548B1
公开(公告)日：2001-04-10
申请号：US09523411
申请日：2000-03-10
申请人： Albert H. Ohlig
发明人： Albert H. Ohlig
IPC分类号： G03B2762
CPC分类号： G03F9/00 , H05K3/0008 , H05K3/0082 , H05K2203/1572 , H05K2203/167
摘要： Apparatus that supports and aligns a pair of glass image masters facilitates relative movements of the masters between separated positions to accommodate insertion of a circuit board, and proximate position in precision alignment of the images carried thereby on opposite sides of the circuit board. Various configurations of reference blocks and engaging followers mounted on one and the other masters assure precision alignment of the masters in proximate position, and resilient bias force exerted in relative orientation between the masters assures precision aligning engagement of followers and reference blocks. Precision positional alignment of one image master relative to the other image master is accomplished by a differential threaded assembly between relatively moveable members interposed between an image master and a follower that engages a reference block.
摘要翻译： 支持和对齐一对玻璃图像母版的装置有助于主机在分离位置之间的相对运动，以适应电路板的插入，以及在电路板的相对侧上承载的图像的精确对准的邻近位置。 安装在一个和另一个主机上的参考块和接合随动件的各种配置确保主机在接近位置的精确对准，并且在主机之间以相对定向施加的弹性偏压力确保跟随器和参考块的精确对准接合。 一个图像母版相对于另一个图像母版的精确位置对准通过插入图像母版和接合参考块的跟随器之间的相对可移动的构件之间的差分螺纹组合来实现。
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公开(公告)号：US06795170B2
公开(公告)日：2004-09-21
申请号：US10299705
申请日：2002-11-20
IPC分类号： G03B2762
CPC分类号： G03F1/64 , G03F7/70983
摘要： A structure for attaching a pellicle to a photomask, the pellicle comprising a pellicle frame and a pellicle sheet attached to an opening portion formed in the pellicle frame, wherein at least a portion of the pellicle frame surface in contact with the photo-mask has a direct contact with the photo-mask without interposing an adhesive.
摘要翻译： 一种用于将防护薄膜组件附接到光掩模的结构，所述防护薄膜组件包括防护薄膜组件框架和附着到形成在所述防护薄膜框架中的开口部分的防护薄膜组件，其中所述防护薄膜组件框架表面中的与所述光掩模接触的部分具有 直接接触光罩而不插入胶粘剂。
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公开(公告)号：US06734445B2
公开(公告)日：2004-05-11
申请号：US09840364
申请日：2001-04-23
申请人： Arun Ramamoorthy , Hsing-Chien Ma
发明人： Arun Ramamoorthy , Hsing-Chien Ma
IPC分类号： G03B2762
CPC分类号： G03F1/64 , G03F7/70983
摘要： Apparatus and methods to protect a photomask that is used for semiconductor photolithography at wavelengths outside the visible spectrum include a pellicle that is readily retracted during exposure or to provide access to the photomask. The pellicle can be transparent at an inspection wavelength and opaque at an exposure wavelength. In various embodiments, the pellicle is slid, retracted, or pivoted relative to a base aligned with the photomask, thus uncovering the photomask. When overlying the photomask, the pellicle can be secured with magnetic elements, such as magnets or electromagnets. In another embodiment, the pellicle includes a diaphragm that can be opened or closed. Methods of using a pellicle are also described.
摘要翻译： 用于保护在可见光谱外的波长处用于半导体光刻的光掩模的装置和方法包括在曝光期间容易缩回或提供对光掩模的访问的防护薄膜组件。 防护薄膜组件在检测波长下可以是透明的，并且在曝光波长处是不透明的。 在各种实施例中，防护薄膜组件相对于与光掩模对准的底座滑动，缩回或枢转，从而露出光掩模。 当覆盖光掩模时，防护薄膜组件可以用诸如磁体或电磁体的磁性元件固定。 在另一个实施例中，防护薄膜组件包括可打开或关闭的隔膜。 还描述了使用防护薄膜的方法。
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公开(公告)号：US06630988B2
公开(公告)日：2003-10-07
申请号：US09894482
申请日：2001-06-28
IPC分类号： G03B2762
CPC分类号： G03B27/62 , Y10S414/135
摘要： Methods and apparatus for ensuring the proper handling of reticles in the manufacturing of microdevices are disclosed. The methods and apparatus employ one or more reticle stop blocks fixed to a reticle handling arm. The one or more reticle stop blocks are designed and arranged to engage an edge of the reticle in order to place the reticle in a desired position on the reticle handling arm should the reticle be improperly arranged in a cassette in which the reticle is stored. By ensuring proper placement of the reticle on the reticle handling arm when the reticle is removed from the cassette, the likelihood of a subsequent fault in handling the reticle is greatly reduced.
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公开(公告)号：US06619359B2
公开(公告)日：2003-09-16
申请号：US09788034
申请日：2001-02-16
IPC分类号： G03B2762
CPC分类号： G03F1/64 , G03F7/70825 , G03F7/70983 , Y10T156/1189 , Y10T156/1744
摘要： The invention features an apparatus for mounting a pellicle to a reticle. The apparatus includes: a base; a first holder coupled to the base and including two edges positioned to support a first object below its center of gravity and secure the first object in substantially vertical alignment with the base, the first object including one of the pellicle and the reticle; a second holder slidably coupled to the base and including two edges positioned to support a second object below its center of gravity and secure the second object in substantially vertical alignment with the base, the second object including the other of the pellicle and the reticle; and a pressure applicator assembly slidably coupled to the base to adjustably apply pressure to a periphery of the second object held in the second holder and drive it against a corresponding periphery of the first object held in the first holder. In additional embodiments, the apparatus provides automated mounted of the pellicle and reticle.
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