公开(公告)号：US20210017038A1

公开(公告)日：2021-01-21

申请号：US17044727

申请日：2019-04-03

Applicant: Reliance Industries Limited

Inventor： Sateesh Daggupati ,  Sachchit Majhi ,  Sukumar Mandal ,  Asit Kumar Das ,  Vipulkumar Rameshbhai Panchotia ,  Mehul Bharatbhai Joshi ,  Gopal Ravichandran ,  Praveen Kumar Chinthala ,  Swapan Kumar Ghosh ,  Vishwanath Sapre Ajit

IPC: C01G31/02 ,  C22B7/00 ,  C22B3/04 ,  C22B1/14 ,  C22B1/02 ,  C22B3/22 ,  C22B3/44

Abstract: A process for obtaining vanadium component in the form of vanadium oxide from gasifier slag is disclosed. The process comprises pulverizing the slag to obtain pulverized slag, which is blended with water and an alkali salt to obtain a slurry. The slurry is dried and then roasted in the presence of air to obtain a roasted slag. The roasted slag is leached to obtain a first filtrate comprising the vanadium component. The first filtrate is reacted with a magnesium salt to remove a silica component in the form of a precipitate. The silica free second filtrate is reacted with an ammonium salt to obtain ammonium metavanadate, which is further calcined to obtain the significant amount of vanadium pentoxide (V2O5).