公开(公告)号：US11527381B2

公开(公告)日：2022-12-13

申请号：US17191218

申请日：2021-03-03

Applicant: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.

Inventor： Kazuhisa Ishibashi ,  Tetsuya Kudo ,  Mikio Yamaguchi

IPC: H01J37/317 ,  H01J37/304

Abstract: There is provided an ion implanter including a beam generation device that generates an ion beam, based on an implantation recipe, a plurality of measurement devices that measure at least one physical quantity of the ion beam, and a control device that acquires a data set including a plurality of measurement values measured by the plurality of measurement devices, and evaluates measurement validity of the at least one physical quantity of the ion beam by using a model representing a correlation between the plurality of measurement values.