公开(公告)号：US20230119614A1

公开(公告)日：2023-04-20

申请号：US17963944

申请日：2022-10-11

Applicant: Samsung Display Co., Ltd.

Inventor： Sangshin LEE ,  Sanghoon KIM ,  Jongsung PARK ,  Sang Min YI ,  Seungjin LEE ,  Eunjoung JUNG

IPC: C23C14/04 ,  H01L51/00

Abstract: A mask assembly includes a first mask having a first opening and at least one second mask disposed on the first mask, each at least one second mask including a deposition area having second openings, an inner area surrounding the deposition area, and an outer area having third openings which surround the margin area. A line defining the outer boundary of an inner surface which defines the first opening overlaps the inner area when viewed in plan.

公开(公告)号：US20220102446A1

公开(公告)日：2022-03-31

申请号：US17547185

申请日：2021-12-09

Applicant: Samsung Display Co., Ltd.

Inventor： Dae Won BAEK ,  Sang Min YI ,  Sang Shin LEE ,  Sung Chul KIM ,  Joon Young PARK

IPC: H01L27/32 ,  H01L51/52

Abstract: A display device is provided. The display device includes a display region which includes a first display region and a second display region, where the first display region includes a plurality of first pixels, and the second display region includes a plurality of second pixels and at least one light transmission region, where the light transmission region has light transmittance that is higher than light transmittance of the first pixel and light transmittance of the second pixel, and the second display region has light transmittance that is higher than light transmittance of the first display region.

公开(公告)号：US20160248049A1

公开(公告)日：2016-08-25

申请号：US14874241

申请日：2015-10-02

Applicant: Samsung Display Co., Ltd.

Inventor： Jae Min HONG ,  Jung-Hoon KIM ,  Hong Ryul KIM ,  Suk Beom YOU ,  Sang Min YI ,  Young-Geun CHO

IPC: H01L51/56 ,  C23C14/35 ,  H01L51/00

CPC classification number: C23C14/562 ,  C23C14/042 ,  H01L51/001 ,  H01L51/0011

Abstract: A deposition apparatus comprises a chamber, a deposition material supplier positioned in the chamber and configured to contain and supply a deposition material, a substrate holder disposed in the chamber and configured to hold a substrate such that a major surface of the substrate faces the deposition material supplier; and a mask retainer disposed in the chamber and configured to retain a mask disposed over the major surface of the substrate. The mask retainer comprises a base, and a plurality of magnets coupled to the base, at least one of the plurality of magnets being movable with respect to the base, the plurality of magnets being configured to apply magnetic force to the mask such that the mask is fixed to the substrate without substantial movement of the mask with respect to the substrate during deposition of the deposition material.

Abstract translation: 沉积设备包括室，沉积材料供应器，其位于室中并且构造成容纳和供应沉积材料;衬底保持器，其设置在室中并且构造成保持衬底，使得衬底的主表面面向沉积材料 供应商 以及掩模保持器，其设置在所述室中并且被配置为保持设置在所述基板的主表面上方的掩模。 掩模保持器包括基部和耦合到基部的多个磁体，多个磁体中的至少一个相对于基座可移动，多个磁体被配置为向掩模施加磁力，使得掩模 在沉积材料沉积期间固定到基底上而不会使掩模相对于基底基本上移动。