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    ULTRAPURE WATER PRODUCTION FACILITY AND METHOD OF REPLACING ION EXCHANGE RESIN
    11.
    发明公开
    ULTRAPURE WATER PRODUCTION FACILITY AND METHOD OF REPLACING ION EXCHANGE RESIN 审中-公开

    公开(公告)号：US20230264987A1

    公开(公告)日：2023-08-24

    申请号：US18171757

    申请日：2023-02-21

    Applicant: Samsung Electronics Co., Ltd.

    Inventor： Yongjai LEE ,  Sanghoon Yoon ,  Huchul Lee ,  Byungchan Choi ,  Jieun Jang

    IPC: C02F1/42

    CPC classification number: C02F1/42 ,  C02F2103/04

    Abstract: An ultrapure water (UPW) production facility includes a polisher filled with an ion exchange resin, an inflow line, an inflow valve connected to the inflow line and upstream of the polisher, an outflow line, an outflow valve connected to the outflow line and downstream of the polisher, a first drain line connected to the polisher, a first drain valve connected to the first drain line and downstream of the polisher, a second drain line branched from the outflow line, a second drain valve connected to the second drain line, a discharge line branched from the second drain line, a discharge valve connected to the discharge line, wherein the inflow valve, the outflow valve, the first drain valve, the second drain valve, and the outflow valve are automatic valves.

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